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Polymerization Inhibition by Triplet State Absorption for Nanoscale Lithography

Harke, Benjamin ; Dallari, William ; Grancini, Giulia ; Fazzi, Daniele ; Brandi, Fernando ; Petrozza, Annamaria ; Diaspro, Alberto

Advanced materials (Weinheim), 2013-02, Vol.25 (6), p.904-909 [Periódico revisado por pares]

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Título:
Polymerization Inhibition by Triplet State Absorption for Nanoscale Lithography
Autor: Harke, Benjamin ; Dallari, William ; Grancini, Giulia ; Fazzi, Daniele ; Brandi, Fernando ; Petrozza, Annamaria ; Diaspro, Alberto
Assuntos: 7-diethylamino-3-thenoylcoumarin (DETC) ; Communications ; Density functional theory ; Diffraction ; Inhibition ; isopropyl thioxanthone (ITX) ; Lithography ; Nanocomposites ; Nanomaterials ; Nanostructure ; photoinduced absorption ; Polymerization ; reversible saturable optical fluorescence transition (RESOLFT) ; stimulated emission depletion (STED)
É parte de: Advanced materials (Weinheim), 2013-02, Vol.25 (6), p.904-909
Notas: ArticleID:ADMA201204141
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SourceType-Scholarly Journals-1
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Descrição: The diffraction limit in direct‐laser‐writing (DLW) lithography can be circumvented by selective inhibition of the polymerization. By combining nanosecond transient absorption spectroscopy and density functional theory it is demonstrated that polymerization inhibition is possible by a direct absorption of the lowest triplet state. Polymerization inhibition by triplet state absorption (TSA) has the potential to bring DLW lithography into the nanometer scale.
Editor: Weinheim: WILEY-VCH Verlag
Idioma: Inglês

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