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Material Type: Artigo
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Parasitic reaction and its effect on the growth rate of AlN by metalorganic chemical vapor depositionZhao, D.G. ; Zhu, J.J. ; Jiang, D.S. ; Yang, Hui ; Liang, J.W. ; Li, X.Y. ; Gong, H.M.Journal of crystal growth, 2006-03, Vol.289 (1), p.72-75 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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Material Type: Artigo
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Cathodoluminescence of epitaxial GaN and ZnO thin films for scintillator applicationsSchenk, H.P.D. ; Borenstain, S.I. ; Berezin, A. ; Schön, A. ; Cheifetz, E. ; Dadgar, A. ; Krost, A.Journal of crystal growth, 2009-08, Vol.311 (16), p.3984-3988 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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Material Type: Artigo
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N-type doping of HVPE-grown GaN using dichlorosilaneRichter, E. ; Hennig, Ch ; Zeimer, U. ; Wang, L. ; Weyers, M. ; Tränkle, G.Physica status solidi. A, Applications and materials science, 2006-05, Vol.203 (7), p.1658-1662 [Periódico revisado por pares]Berlin: WILEY-VCH VerlagTexto completo disponível |
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Material Type: Artigo
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On the Interplay Between Electrical Conductivity and Seebeck Coefficient in Ultra-Narrow Silicon NanowiresNeophytou, Neophytos ; Kosina, HansJournal of electronic materials, 2012-06, Vol.41 (6), p.1305-1311 [Periódico revisado por pares]Boston: Springer USTexto completo disponível |
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Material Type: Artigo
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DC baseband and high-frequency characteristics of a silicon nanowire field effect transistor circuitLi, Yiming ; Hwang, Chih-HongSemiconductor science and technology, 2009-04, Vol.24 (4), p.045004-045004 (8) [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |
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Material Type: Artigo
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Characterization of the acid-base nature of metal oxides by adsorption of TCNQMeguro, Kenjiro ; Esumi, KunioJournal of adhesion science and technology, 1990-01, Vol.4 (1), p.393-410 [Periódico revisado por pares]Leiden: Taylor & Francis GroupTexto completo disponível |