Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Deposition of microcrystalline intrinsic silicon by the Electrical Asymmetry Effect techniqueHrunski, D. ; Mootz, F. ; Zeuner, A. ; Janssen, A. ; Rost, H. ; Beckmann, R. ; Binder, S. ; Schüngel, E. ; Mohr, S. ; Luggenhölscher, D. ; Czarnetzki, U. ; Grabosch, G.Vacuum, 2013-01, Vol.87, p.114-118 [Periódico revisado por pares]Elsevier LtdTexto completo disponível |
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2 |
Material Type: Ata de Congresso
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Ion Beam Figuring (IBF) for high Precision Optics becomes affordableKIONTKE, Sven ; DEMMLER, Marcel ; ZEUNER, Michael ; ALLENSTEIN, Frank ; DUNGER, Thoralf ; NESTLER, MatthiasProceedings of SPIE, the International Society for Optical Engineering, 2010, Vol.7786Bellingham, Wash: SPIETexto completo disponível |
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3 |
Material Type: Artigo
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Optimisation and characterisation of a TCP type RF broad beam ion sourceZeuner, Michael ; Scholze, Frank ; Dathe, Bernd ; Neumann, HorstSurface & coatings technology, 2001-07, Vol.142, p.39-48 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
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4 |
Material Type: Artigo
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A unique ECR broad beam source for thin film processingZeuner, Michael ; Scholze, Frank ; Neumann, Horst ; Chassé, Thomas ; Otto, Gunther ; Roth, Dietmar ; Hellmich, Anke ; Ocker, BertholdSurface & coatings technology, 2001-07, Vol.142, p.11-20 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
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5 |
Material Type: Artigo
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Particle energy and angle distributions in ion beam sputteringFranke, E. ; Neumann, H. ; Zeuner, M. ; Frank, W. ; Bigl, F.Surface & coatings technology, 1997-12, Vol.97 (1), p.90-96 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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6 |
Material Type: Artigo
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Mo/Si multilayers for EUV lithography by ion beam sputter depositionChassé, T. ; Neumann, H. ; Ocker, B. ; Scherer, M. ; Frank, W. ; Frost, F. ; Hirsch, D. ; Schindler, A. ; Wagner, G. ; Lorenz, M. ; Otto, G. ; Zeuner, M. ; Rauschenbach, B.Vacuum, 2003-05, Vol.71 (3), p.407-415 [Periódico revisado por pares]Oxford: Elsevier LtdTexto completo disponível |
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7 |
Material Type: Artigo
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Scalable large volume ECR plasma generation for low pressure applicationsScholze, F. ; Neumann, H. ; Zeuner, M. ; Bigl, F. ; Mai, J.Surface & coatings technology, 1997-12, Vol.97 (1), p.755-758 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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8 |
Material Type: Artigo
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CVD diamond sensors for charged particle detectionKrammer, M. ; Adam, W. ; Berdermann, E. ; Bergonzo, P. ; Bertuccio, G. ; Bogani, F. ; Borchi, E. ; Brambilla, A. ; Bruzzi, M. ; Colledani, C. ; Conway, J. ; D'Angelo, P. ; Dabrowski, W. ; Delpierre, P. ; Deneuville, A. ; Dulinski, W. ; van Eijk, B. ; Fallou, A. ; Fizzotti, F. ; Foulon, F. ; Friedl, M. ; Gan, K.K. ; Gheeraert, E. ; Hallewell, G. ; Han, S. ; Hartjes, F. ; Hrubec, J. ; Husson, D. ; Kagan, H. ; Kania, D. ; Kaplon, J. ; Kass, R. ; Koeth, T. ; Logiudice, A. ; Lu, R. ; MacLynne, L. ; Manfredotti, C. ; Meier, D. ; Mishina, M. ; Moroni, L. ; Oh, A. ; Pan, L.S. ; Pernicka, M. ; Peitz, A. ; Perera, L. ; Pirollo, S. ; Procario, M. ; Riester, J.L. ; Roe, S. ; Rousseau, L. ; Rudge, A. ; Russ, J. ; Sala, S. ; Sampietro, M. ; Schnetzer, S. ; Sciortino, S. ; Stelzer, H. ; Stone, R. ; Suter, B. ; Tapper, R.J. ; Tesarek, R. ; Trischuk, W. ; Tromson, D. ; Vittone, E. ; Walsh, A.M. ; Wedenig, R. ; Weilhammer, P. ; Wetstein, M. ; White, C. ; Zeuner, W. ; Zoeller, M.Diamond and related materials, 2001-09, Vol.10 (9), p.1778-1782 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |