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1 |
Material Type: Artigo
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Physical chemistry of the TiN/Hf0.5Zr0.5O2 interfaceHamouda, W. ; Pancotti, A. ; Lubin, C. ; Tortech, L. ; Richter, C. ; Mikolajick, T. ; Schroeder, U. ; Barrett, N.Journal of applied physics, 2020-02, Vol.127 (6) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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Material Type: Artigo
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Ferroelectrics everywhere: Ferroelectricity in magnesium substituted zinc oxide thin filmsFerri, Kevin ; Bachu, Saiphaneendra ; Zhu, Wanlin ; Imperatore, Mario ; Hayden, John ; Alem, Nasim ; Giebink, Noel ; Trolier-McKinstry, Susan ; Maria, Jon-PaulJournal of applied physics, 2021-07, Vol.130 (4) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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Material Type: Artigo
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Air sensitivity of MoS2, MoSe2, MoTe2, HfS2, and HfSe2Mirabelli, Gioele ; McGeough, Conor ; Schmidt, Michael ; McCarthy, Eoin K. ; Monaghan, Scott ; Povey, Ian M. ; McCarthy, Melissa ; Gity, Farzan ; Nagle, Roger ; Hughes, Greg ; Cafolla, Attilio ; Hurley, Paul K. ; Duffy, RayJournal of applied physics, 2016-09, Vol.120 (12) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
4 |
Material Type: Artigo
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Structural changes and conductance thresholds in metal-free intrinsic SiOx resistive random access memoryMehonic, Adnan ; Buckwell, Mark ; Montesi, Luca ; Garnett, Leon ; Hudziak, Stephen ; Fearn, Sarah ; Chater, Richard ; McPhail, David ; Kenyon, Anthony J.Journal of applied physics, 2015-03, Vol.117 (12) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
5 |
Material Type: Artigo
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Experimental evidence of ferroelectricity in calcium doped hafnium oxide thin filmsYao, Yifan ; Zhou, Dayu ; Li, Shuaidong ; Wang, Jingjing ; Sun, Nana ; Liu, Feng ; Zhao, XiumingJournal of applied physics, 2019-10, Vol.126 (15) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
6 |
Material Type: Artigo
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Carrier localization in the vicinity of dislocations in InGaNMassabuau, F. C-P. ; Chen, P. ; Horton, M. K. ; Rhode, S. L. ; Ren, C. X. ; O'Hanlon, T. J. ; Kovács, A. ; Kappers, M. J. ; Humphreys, C. J. ; Dunin-Borkowski, R. E. ; Oliver, R. A.Journal of applied physics, 2017-01, Vol.121 (1) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
7 |
Material Type: Artigo
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Growth of HfO2/TiO2 nanolaminates by atomic layer deposition and HfO2-TiO2 by atomic partial layer depositionHernández-Arriaga, H. ; López-Luna, E. ; Martínez‐Guerra, E. ; Turrubiartes, M. M. ; Rodríguez, A. G. ; Vidal, M. A.Journal of applied physics, 2017-02, Vol.121 (6) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
8 |
Material Type: Artigo
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Thermal noise in contact atomic force microscopyMa, Chengfu ; Zhou, Chenggang ; Peng, Jinlan ; Chen, Yuhang ; Arnold, Walter ; Chu, JiaruJournal of applied physics, 2021-06, Vol.129 (23) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
9 |
Material Type: Artigo
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Comprehensive study on initial thermal oxidation of GaN(0001) surface and subsequent oxide growth in dry oxygen ambientYamada, Takahiro ; Ito, Joyo ; Asahara, Ryohei ; Watanabe, Kenta ; Nozaki, Mikito ; Nakazawa, Satoshi ; Anda, Yoshiharu ; Ishida, Masahiro ; Ueda, Tetsuzo ; Yoshigoe, Akitaka ; Hosoi, Takuji ; Shimura, Takayoshi ; Watanabe, HeijiJournal of applied physics, 2017-01, Vol.121 (3) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
10 |
Material Type: Artigo
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Impact of sapphire nitridation on formation of Al-polar inversion domains in N-polar AlN epitaxial layersStolyarchuk, N. ; Markurt, T. ; Courville, A. ; March, K. ; Tottereau, O. ; Vennéguès, P. ; Albrecht, M.Journal of applied physics, 2017-10, Vol.122 (15) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |