Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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11 |
Material Type: Artigo
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Methane as a novel doping precursor for deposition of highly conductive ZnO thin films by magnetron sputteringVasin, A.V. ; Rusavsky, A.V. ; Bortchagovsky, E.G. ; Gomeniuk, Y.V. ; Nikolenko, A.S. ; Strelchuk, V.V. ; Yatskiv, R. ; Tiagulskyi, S. ; Prucnal, S. ; Skorupa, W. ; Nazarov, A.N.Vacuum, 2020-04, Vol.174, p.109199, Article 109199 [Periódico revisado por pares]Elsevier LtdTexto completo disponível |
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12 |
Material Type: Artigo
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Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron SputteringBanyamin, Ziad Y ; Kelly, Peter J ; West, Glen ; Boardman, JefferyCoatings (Basel), 2014-12, Vol.4 (4), p.732-746 [Periódico revisado por pares]Basel: MDPI AGTexto completo disponível |
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13 |
Material Type: Artigo
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Preparation of Multielements Mixture Thin Film by One-Step Process Sputtering Deposition Using Mixture Powder TargetKawasaki, Hiroharu ; Ohshima, Tamiko ; Yagyu, Yoshihito ; Ihara, Takeshi ; Suda, YoshiakiIEEE transactions on plasma science, 2021-01, Vol.49 (1), p.48-52 [Periódico revisado por pares]IEEETexto completo disponível |
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14 |
Material Type: Artigo
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Application of the plasma surface sintering conditions in the synthesis of ReBx–Ti targets employed for hard films deposition in magnetron sputtering techniqueWicher, Bartosz ; Chodun, Rafał ; Trzcinski, Marek ; Lachowski, Artur ; Nowakowska-Langier, Katarzyna ; Ibrahim, Samih Haj ; Jaroszewicz, Jakub ; Kubiś, Michał ; Grzanka, Ewa ; Zdunek, KrzysztofInternational journal of refractory metals & hard materials, 2022-02, Vol.103, p.105756, Article 105756 [Periódico revisado por pares]Shrewsbury: Elsevier LtdTexto completo disponível |
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15 |
Material Type: Artigo
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High entropy alloy thin films deposited by magnetron sputtering of powder targetsBraeckman, B.R. ; Boydens, F. ; Hidalgo, H. ; Dutheil, P. ; Jullien, M. ; Thomann, A.-L. ; Depla, D.Thin solid films, 2015-04, Vol.580, p.71-76 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
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16 |
Material Type: Artigo
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Preparation of functional thin films with elemental gradient by sputtering with mixed powder targetsKawasaki, Hiroharu ; Ohshima, Tamiko ; Yagyu, Yoshihito ; Ihara, Takeshi ; Mitsuhashi, Kazuhiko ; Nishiguchi, Hiroshi ; Suda, YoshiakiJapanese Journal of Applied Physics, 2022-01, Vol.61 (SA), p.SA1019 [Periódico revisado por pares]Tokyo: IOP PublishingTexto completo disponível |
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17 |
Material Type: Artigo
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Surface sintering of tungsten powder targets designed by electromagnetic discharge: A novel approach for film synthesis in magnetron sputteringWicher, B. ; Zdunek, K. ; Chodun, R. ; Haj Ibrahim, S. ; Kubiś, M. ; Lachowski, A. ; Król, K. ; Jaroszewicz, J. ; Minikayev, R. ; Nowakowska-Langier, K.Materials & design, 2020-06, Vol.191, p.108634, Article 108634 [Periódico revisado por pares]Elsevier LtdTexto completo disponível |
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18 |
Material Type: Artigo
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Effect of Cu doping on the structural, optical and electrical properties of ZnO thin films grown by RF magnetron sputtering: application to solar photocatalysisKhalfallah, B. ; Riahi, I. ; Chaabouni, F.Optical and quantum electronics, 2021-05, Vol.53 (5), Article 238 [Periódico revisado por pares]New York: Springer USTexto completo disponível |
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19 |
Material Type: Artigo
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Preparation of Ni-doped stainless steel thin films on metal to prevent hydrogen entry via sputter deposition with a powder targetKawasaki, Hiroharu ; Nishiguchi, Hiroshi ; Ohshima, Tamiko ; Yagyu, Yoshihito ; Ihara, TakeshiJapanese Journal of Applied Physics, 2021-01, Vol.60 (SA), p.SAAB10 [Periódico revisado por pares]Tokyo: IOP PublishingTexto completo disponível |
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20 |
Material Type: Artigo
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Preparation of Ti and Fe Composition Gradient Thin Films by Sputtering with Mixed Powder TargetsSatake, Takahiko ; Kawasaki, Hiroharu ; Aoqui, Shin-ichiE-journal of surface science and nanotechnology, 2023-02, Vol.21 (3) [Periódico revisado por pares]Tokyo: Japan Science and Technology AgencyTexto completo disponível |