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11
Methane as a novel doping precursor for deposition of highly conductive ZnO thin films by magnetron sputtering
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Methane as a novel doping precursor for deposition of highly conductive ZnO thin films by magnetron sputtering

Vasin, A.V. ; Rusavsky, A.V. ; Bortchagovsky, E.G. ; Gomeniuk, Y.V. ; Nikolenko, A.S. ; Strelchuk, V.V. ; Yatskiv, R. ; Tiagulskyi, S. ; Prucnal, S. ; Skorupa, W. ; Nazarov, A.N.

Vacuum, 2020-04, Vol.174, p.109199, Article 109199 [Periódico revisado por pares]

Elsevier Ltd

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12
Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering
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Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering

Banyamin, Ziad Y ; Kelly, Peter J ; West, Glen ; Boardman, Jeffery

Coatings (Basel), 2014-12, Vol.4 (4), p.732-746 [Periódico revisado por pares]

Basel: MDPI AG

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13
Preparation of Multielements Mixture Thin Film by One-Step Process Sputtering Deposition Using Mixture Powder Target
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Preparation of Multielements Mixture Thin Film by One-Step Process Sputtering Deposition Using Mixture Powder Target

Kawasaki, Hiroharu ; Ohshima, Tamiko ; Yagyu, Yoshihito ; Ihara, Takeshi ; Suda, Yoshiaki

IEEE transactions on plasma science, 2021-01, Vol.49 (1), p.48-52 [Periódico revisado por pares]

IEEE

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14
Application of the plasma surface sintering conditions in the synthesis of ReBx–Ti targets employed for hard films deposition in magnetron sputtering technique
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Application of the plasma surface sintering conditions in the synthesis of ReBx–Ti targets employed for hard films deposition in magnetron sputtering technique

Wicher, Bartosz ; Chodun, Rafał ; Trzcinski, Marek ; Lachowski, Artur ; Nowakowska-Langier, Katarzyna ; Ibrahim, Samih Haj ; Jaroszewicz, Jakub ; Kubiś, Michał ; Grzanka, Ewa ; Zdunek, Krzysztof

International journal of refractory metals & hard materials, 2022-02, Vol.103, p.105756, Article 105756 [Periódico revisado por pares]

Shrewsbury: Elsevier Ltd

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15
High entropy alloy thin films deposited by magnetron sputtering of powder targets
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High entropy alloy thin films deposited by magnetron sputtering of powder targets

Braeckman, B.R. ; Boydens, F. ; Hidalgo, H. ; Dutheil, P. ; Jullien, M. ; Thomann, A.-L. ; Depla, D.

Thin solid films, 2015-04, Vol.580, p.71-76 [Periódico revisado por pares]

Elsevier B.V

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16
Preparation of functional thin films with elemental gradient by sputtering with mixed powder targets
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Preparation of functional thin films with elemental gradient by sputtering with mixed powder targets

Kawasaki, Hiroharu ; Ohshima, Tamiko ; Yagyu, Yoshihito ; Ihara, Takeshi ; Mitsuhashi, Kazuhiko ; Nishiguchi, Hiroshi ; Suda, Yoshiaki

Japanese Journal of Applied Physics, 2022-01, Vol.61 (SA), p.SA1019 [Periódico revisado por pares]

Tokyo: IOP Publishing

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17
Surface sintering of tungsten powder targets designed by electromagnetic discharge: A novel approach for film synthesis in magnetron sputtering
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Surface sintering of tungsten powder targets designed by electromagnetic discharge: A novel approach for film synthesis in magnetron sputtering

Wicher, B. ; Zdunek, K. ; Chodun, R. ; Haj Ibrahim, S. ; Kubiś, M. ; Lachowski, A. ; Król, K. ; Jaroszewicz, J. ; Minikayev, R. ; Nowakowska-Langier, K.

Materials & design, 2020-06, Vol.191, p.108634, Article 108634 [Periódico revisado por pares]

Elsevier Ltd

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18
Effect of Cu doping on the structural, optical and electrical properties of ZnO thin films grown by RF magnetron sputtering: application to solar photocatalysis
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Effect of Cu doping on the structural, optical and electrical properties of ZnO thin films grown by RF magnetron sputtering: application to solar photocatalysis

Khalfallah, B. ; Riahi, I. ; Chaabouni, F.

Optical and quantum electronics, 2021-05, Vol.53 (5), Article 238 [Periódico revisado por pares]

New York: Springer US

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19
Preparation of Ni-doped stainless steel thin films on metal to prevent hydrogen entry via sputter deposition with a powder target
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Preparation of Ni-doped stainless steel thin films on metal to prevent hydrogen entry via sputter deposition with a powder target

Kawasaki, Hiroharu ; Nishiguchi, Hiroshi ; Ohshima, Tamiko ; Yagyu, Yoshihito ; Ihara, Takeshi

Japanese Journal of Applied Physics, 2021-01, Vol.60 (SA), p.SAAB10 [Periódico revisado por pares]

Tokyo: IOP Publishing

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20
Preparation of Ti and Fe Composition Gradient Thin Films by Sputtering with Mixed Powder Targets
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Preparation of Ti and Fe Composition Gradient Thin Films by Sputtering with Mixed Powder Targets

Satake, Takahiko ; Kawasaki, Hiroharu ; Aoqui, Shin-ichi

E-journal of surface science and nanotechnology, 2023-02, Vol.21 (3) [Periódico revisado por pares]

Tokyo: Japan Science and Technology Agency

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