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Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering
Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering
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Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering

Banyamin, Ziad Y ; Kelly, Peter J ; West, Glen ; Boardman, Jeffery

Coatings (Basel), 2014-12, Vol.4 (4), p.732-746 [Periódico revisado por pares]

Basel: MDPI AG

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Application of the plasma surface sintering conditions in the synthesis of ReBx–Ti targets employed for hard films deposition in magnetron sputtering technique
Application of the plasma surface sintering conditions in the synthesis of ReBx–Ti targets employed for hard films deposition in magnetron sputtering technique
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Application of the plasma surface sintering conditions in the synthesis of ReBx–Ti targets employed for hard films deposition in magnetron sputtering technique

Wicher, Bartosz ; Chodun, Rafał ; Trzcinski, Marek ; Lachowski, Artur ; Nowakowska-Langier, Katarzyna ; Ibrahim, Samih Haj ; Jaroszewicz, Jakub ; Kubiś, Michał ; Grzanka, Ewa ; Zdunek, Krzysztof

International journal of refractory metals & hard materials, 2022-02, Vol.103, p.105756, Article 105756 [Periódico revisado por pares]

Shrewsbury: Elsevier Ltd

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3
High entropy alloy thin films deposited by magnetron sputtering of powder targets
High entropy alloy thin films deposited by magnetron sputtering of powder targets
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High entropy alloy thin films deposited by magnetron sputtering of powder targets

Braeckman, B.R. ; Boydens, F. ; Hidalgo, H. ; Dutheil, P. ; Jullien, M. ; Thomann, A.-L. ; Depla, D.

Thin solid films, 2015-04, Vol.580, p.71-76 [Periódico revisado por pares]

Elsevier B.V

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4
Preparation of Ni-doped stainless steel thin films on metal to prevent hydrogen entry via sputter deposition with a powder target
Preparation of Ni-doped stainless steel thin films on metal to prevent hydrogen entry via sputter deposition with a powder target
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Preparation of Ni-doped stainless steel thin films on metal to prevent hydrogen entry via sputter deposition with a powder target

Kawasaki, Hiroharu ; Nishiguchi, Hiroshi ; Ohshima, Tamiko ; Yagyu, Yoshihito ; Ihara, Takeshi

Japanese Journal of Applied Physics, 2021-01, Vol.60 (SA), p.SAAB10 [Periódico revisado por pares]

Tokyo: IOP Publishing

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5
Sputter deposited LiPON thin films from powder target as electrolyte for thin film battery applications
Sputter deposited LiPON thin films from powder target as electrolyte for thin film battery applications
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Sputter deposited LiPON thin films from powder target as electrolyte for thin film battery applications

Nimisha, C.S. ; Rao, K. Yellareswar ; Venkatesh, G. ; Rao, G. Mohan ; Munichandraiah, N.

Thin solid films, 2011-03, Vol.519 (10), p.3401-3406 [Periódico revisado por pares]

Elsevier B.V

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6
Sputtering Deposition With Low Cost Multi-Element Powder Targets
Sputtering Deposition With Low Cost Multi-Element Powder Targets
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Sputtering Deposition With Low Cost Multi-Element Powder Targets

Ohshima, Tamiko

IEEE open journal of nanotechnology, 2023, Vol.4, p.172-180 [Periódico revisado por pares]

New York: IEEE

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7
Indium-gallium-zinc oxide thin-film preparation via single-step radio frequency sputter deposition using mixed-oxide powder targets
Indium-gallium-zinc oxide thin-film preparation via single-step radio frequency sputter deposition using mixed-oxide powder targets
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Indium-gallium-zinc oxide thin-film preparation via single-step radio frequency sputter deposition using mixed-oxide powder targets

Satake, Takahiko ; Kawasaki, Hiroharu ; Aoqiu, Shin-Ichi

Archives of Electrical Engineering (Online), 2023-01, Vol.72 (2), p.555-563 [Periódico revisado por pares]

Warsaw: Polish Academy of Sciences

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8
Study on the influence of powder size on the properties of BTS/ITO thin film by RF sputtering from powder target
Study on the influence of powder size on the properties of BTS/ITO thin film by RF sputtering from powder target
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Study on the influence of powder size on the properties of BTS/ITO thin film by RF sputtering from powder target

Zhu, GS ; Xu, HR ; Li, JJ ; Wang, P ; Zhang, XY ; Chen, YD ; Yan, DL ; Yu, AB

Materials letters, 2017-05, Vol.194, p.90-93 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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9
The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering
The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering
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The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering

Boydens, F. ; Leroy, W.P. ; Persoons, R. ; Depla, D.

Thin solid films, 2013-03, Vol.531, p.32-41 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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10
The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder target
The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder target
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The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder target

Karthikeyan, Sreejith ; Hill, Arthur E. ; Pilkington, Richard D.

Thin solid films, 2014-01, Vol.550, p.140-144 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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