Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Effect of deposition time on the photocatalytic activity of sputtered mixed ZnO–SnO2 thin films under visible light irradiationRiahi, I. ; Khalfallah, B. ; Chaabouni, F.Solid state communications, 2021-12, Vol.340, p.114487, Article 114487 [Periódico revisado por pares]Elsevier LtdTexto completo disponível |
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2 |
Material Type: Artigo
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High entropy alloy thin films deposited by magnetron sputtering of powder targetsBraeckman, B.R. ; Boydens, F. ; Hidalgo, H. ; Dutheil, P. ; Jullien, M. ; Thomann, A.-L. ; Depla, D.Thin solid films, 2015-04, Vol.580, p.71-76 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
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3 |
Material Type: Artigo
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Sputter deposited LiPON thin films from powder target as electrolyte for thin film battery applicationsNimisha, C.S. ; Rao, K. Yellareswar ; Venkatesh, G. ; Rao, G. Mohan ; Munichandraiah, N.Thin solid films, 2011-03, Vol.519 (10), p.3401-3406 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
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4 |
Material Type: Artigo
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Investigation into the optoelectrical properties of TiO2 thin films, deposited by RF magnetron sputtering using powder targetBen Jemaa, I. ; Chaabouni, F. ; Abaab, M.Physica status solidi. A, Applications and materials science, 2017-02, Vol.214 (2), p.n/a [Periódico revisado por pares]Weinheim: Wiley Subscription Services, IncTexto completo disponível |
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5 |
Material Type: Artigo
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Influence of annealing on thermoelectric properties of bismuth telluride films grown via radio frequency magnetron sputteringHuang, Hu ; Luan, Wei-ling ; Tu, Shan-tungThin solid films, 2009-05, Vol.517 (13), p.3731-3734 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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6 |
Material Type: Artigo
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The influence of target surface morphology on the deposition flux during direct-current magnetron sputteringBoydens, F. ; Leroy, W.P. ; Persoons, R. ; Depla, D.Thin solid films, 2013-03, Vol.531, p.32-41 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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7 |
Material Type: Artigo
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The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder targetKarthikeyan, Sreejith ; Hill, Arthur E. ; Pilkington, Richard D.Thin solid films, 2014-01, Vol.550, p.140-144 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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8 |
Material Type: Artigo
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Deposition of thin films by sputtering cold isostatically pressed powder targets: A case studyBoydens, Francis ; Leroy, Wouter ; Persoons, Rosita ; Depla, DiederikPhysica status solidi. A, Applications and materials science, 2012-03, Vol.209 (3), p.524-530 [Periódico revisado por pares]Berlin: WILEY-VCH VerlagTexto completo disponível |
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9 |
Material Type: Artigo
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Microstructural and tribological properties of sputtered AlCrSiWN films deposited with segmented powder metallurgic target materialsTillmann, Wolfgang ; Fehr, Alexander ; Stangier, DominicThin solid films, 2019-10, Vol.687, p.137465, Article 137465 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
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10 |
Material Type: Artigo
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Growth of ZnO/sapphire heteroepitaxial thin films by radio-frequency sputtering with a raw powder targetSeo, S.H. ; Kang, H.C.Thin solid films, 2010-07, Vol.518 (18), p.5164-5168 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |