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1
Monitored Beam X Ray Absorption Spectrometer
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Monitored Beam X Ray Absorption Spectrometer

Panson, Armand J. ; Kuriyama, Masao

Review of scientific instruments, 1965-10, Vol.36 (10), p.1488-1489 [Periódico revisado por pares]

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2
dc and low frequency noise analysis of Fowler–Nordheim stress of n-channel metal-oxide semiconductor field-effect transistors processed in a 65 nm technology
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dc and low frequency noise analysis of Fowler–Nordheim stress of n-channel metal-oxide semiconductor field-effect transistors processed in a 65 nm technology

Armand, J. ; Martinez, Frédéric ; Benoit, P. ; Valenza, M. ; Vincent, E. ; Huard, V. ; Rochereau, K.

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 2009-05, Vol.27 (3)

American Vacuum Society (AVS)

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3
Acoustic response of a rigid-frame porous medium plate with a periodic set of inclusions
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Acoustic response of a rigid-frame porous medium plate with a periodic set of inclusions

Groby, J.-P. ; Wirgin, A. ; De Ryck, L. ; Lauriks, W. ; Gilbert, R. P. ; Xu, Y. S.

The Journal of the Acoustical Society of America, 2009-08, Vol.126 (2), p.685-693 [Periódico revisado por pares]

Melville, NY: Acoustical Society of America

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4
Reconstruction of material properties profiles in one-dimensional macroscopically inhomogeneous rigid frame porous media in the frequency domain
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Reconstruction of material properties profiles in one-dimensional macroscopically inhomogeneous rigid frame porous media in the frequency domain

DE RYCK, L ; LAURIKS, W ; LECLAIRE, P ; GROBY, J. P ; WIRGIN, A ; DEPOLLIER, C

The Journal of the Acoustical Society of America, 2008-09, Vol.124 (3), p.1591-1606 [Periódico revisado por pares]

Woodbury, NY: Acoustical Society of America

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5
Deposition of silicon dioxide films using the helicon diffusion reactor for integrated optics applications
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Deposition of silicon dioxide films using the helicon diffusion reactor for integrated optics applications

Giroult‐Matlakowski, G. ; Charles, C. ; Durandet, A. ; Boswell, R. W. ; Armand, S. ; Persing, H. M. ; Perry, A. J. ; Lloyd, P. D. ; Hyde, S. R. ; Bogsanyi, D.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1994-09, Vol.12 (5), p.2754-2761 [Periódico revisado por pares]

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6
OPTIMAL-DESIGN OF AN ELECTRET MICROPHONE METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR PREAMPLIFIER
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OPTIMAL-DESIGN OF AN ELECTRET MICROPHONE METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR PREAMPLIFIER

VANDERDONK, AGH ; BERGVELD, P ; VOORTHUYZEN, JA

The Journal of the Acoustical Society of America, 1992-04, Vol.91 (4), p.2261-2269 [Periódico revisado por pares]

WOODBURY: Amer Inst Physics

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7
Simple approximation to thermal attenuation in low‐energy atom–surface scattering
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Simple approximation to thermal attenuation in low‐energy atom–surface scattering

Manson, J. R. ; Armand, G.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1987-07, Vol.5 (4), p.448-451 [Periódico revisado por pares]

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