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Transport Properties of the SiO(2)/Ta(2)O(5) stack as Gate Dielectric in CMOS Processes
Transport Properties of the SiO(2)/Ta(2)O(5) stack as Gate Dielectric in CMOS Processes
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Ata de Congresso 		Adicionar ao Meu Espaço

Transport Properties of the SiO(2)/Ta(2)O(5) stack as Gate Dielectric in CMOS Processes

Devoivre, T. ; Papadas, C. ; Ghibaudo, G. ; Pananakakis, G. ; Setton, M. ; Sandler, N.

28th European Solid-State Device Research Conference, 1998, p.152-155

Editions Frontieres

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2
On the integration of Ta/sub 2/O/sub 5/ as a gate dielectric in sub-0.18 /spl mu/m CMOS processes
On the integration of Ta/sub 2/O/sub 5/ as a gate dielectric in sub-0.18 /spl mu/m CMOS processes
Material Type:
Ata de Congresso 		Adicionar ao Meu Espaço

On the integration of Ta/sub 2/O/sub 5/ as a gate dielectric in sub-0.18 /spl mu/m CMOS processes

Devoivre, T. ; Papadas, C. ; Setton, M. ; Sandler, N. ; Vallier, L. ; Bouras, I.

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168), 1998, p.434-438 [Periódico revisado por pares]

IEEE

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3
A reliable 0.1 /spl mu/m Ta/sub 2/O/sub 5/ transistor manufactured with an almost standard CMOS process
A reliable 0.1 /spl mu/m Ta/sub 2/O/sub 5/ transistor manufactured with an almost standard CMOS process
Material Type:
Ata de Congresso 		Adicionar ao Meu Espaço

A reliable 0.1 /spl mu/m Ta/sub 2/O/sub 5/ transistor manufactured with an almost standard CMOS process

Devoivre, T. ; Papadas, C. ; Setton, M.

1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325), 1999, p.131-132

IEEE

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4
Silicon Nitridation by Nitric Oxide (NO) for Ta2O5 Gate Dielectric Application in MOS Devices
Silicon Nitridation by Nitric Oxide (NO) for Ta2O5 Gate Dielectric Application in MOS Devices
Material Type:
Ata de Congresso 		Adicionar ao Meu Espaço

Silicon Nitridation by Nitric Oxide (NO) for Ta2O5 Gate Dielectric Application in MOS Devices

Devoivre, T. ; Martin, F. ; Papadas, C. ; Setton, M.

29th European Solid-State Device Research Conference, 1999, Vol.1, p.420-423

Editions Frontieres

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5
WiSE video: using in-band wireless loss notification to improve rate-controlled video streaming
WiSE video: using in-band wireless loss notification to improve rate-controlled video streaming
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Ata de Congresso 		Adicionar ao Meu Espaço

WiSE video: using in-band wireless loss notification to improve rate-controlled video streaming

Markopoulou, A. ; Setton, E. ; Kalman, M. ; Apostolopoulos, J.

2004 IEEE International Conference on Multimedia and Expo (ICME) (IEEE Cat. No.04TH8763), 2004, Vol.1, p.249-252 Vol.1

Piscataway NJ: IEEE

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6
Laser-assisted solder closure of bronchial stumps
Laser-assisted solder closure of bronchial stumps
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Ata de Congresso 		Adicionar ao Meu Espaço

Laser-assisted solder closure of bronchial stumps

Oz, Mehmet C ; Williams, Matthew R ; Moscarelli, Richard D ; Kaynar, Murat ; Fras, Christian I ; Libutti, Steven K ; Smith, Hillary ; Setton, Adrianne J ; Treat, Michael R ; Nowygrod, Roman

SPIE 1992

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7
Tissue welding with virus-sterilized human cryoprecipitate
Tissue welding with virus-sterilized human cryoprecipitate
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Tissue welding with virus-sterilized human cryoprecipitate

Williams, Matthew R ; Fras, Christian I ; Moscarelli, Richard D ; Libutti, Steven K ; Oz, Mehmet C ; Bass, Lawrence S ; Setton, Adrianne J ; Kaynar, Murat ; Nowygrod, Roman ; Treat, Michael R

SPIE 1992

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8
Biological processes at Saints Hill water-treatment plant, Kent. Discussion. Authors' reply
Biological processes at Saints Hill water-treatment plant, Kent. Discussion. Authors' reply
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Biological processes at Saints Hill water-treatment plant, Kent. Discussion. Authors' reply

BOURGINE, F. P ; GENNERY, M ; KAUR, K ; HARDWOOD, C ; REDHEAD, A. A ; HOWSAM, P ; BEECHEY, J ; OSBOURNE, D ; GILES, B ; CHAPMAN, J. I ; KERAI, H ; GREEN, J. G ; RAP, R. J ; ELLIS, S ; GAUMARD, C ; SETTON, C ; CHANDLER, J

Journal of the Institution of Water and Environmental Management, 1994, Vol.8 (4), p.379-392

London: Institution of Water and Environmental Management

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