Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Octahedral conversion of a-SiO2 host matrix by pulsed ion implantationZatsepin, D. A. ; Zatsepin, A. F. ; Boukhvalov, D. W. ; Kurmaev, E. Z. ; Gavrilov, N. V. ; Skorikov, N. A. ; von Czarnowski, A. ; Fitting, H.-J.physica status solidi (b), 2015-10, Vol.252 (10), p.2185-2190 [Periódico revisado por pares]Blackwell Publishing LtdTexto completo disponível |
2 |
Material Type: Artigo
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XPS analysis and valence band structure of a low-dimensional SiO2/Si system after Si+ ion implantationZatsepin, D. A. ; Mack, P. ; Wright, A. E. ; Schmidt, B. ; Fitting, H.-J.Physica status solidi. A, Applications and materials science, 2011-07, Vol.208 (7), p.1658-1661 [Periódico revisado por pares]Berlin: WILEY-VCH VerlagTexto completo disponível |
3 |
Material Type: Artigo
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Electron microscopic imaging of an ion beam mixed SiO2/Si interface correlated with photo- and cathodoluminescenceFitting, H.-J. ; Fitting Kourkoutis, L. ; Schmidt, B. ; Liedke, B. ; Ivanova, E. V. ; Zamoryanskaya, M. V. ; Pustovarov, V. A. ; Zatsepin, A. F.Physica status solidi. A, Applications and materials science, 2012-06, Vol.209 (6), p.1101-1108 [Periódico revisado por pares]Berlin: WILEY-VCH VerlagTexto completo disponível |
4 |
Material Type: Artigo
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Silicon nanocluster aggregation in SiO2:Si layersFitting, H.-J. ; Kourkoutis, L. Fitting ; Salh, Roushdey ; Zamoryanskaya, M. V. ; Schmidt, B.Physica status solidi. A, Applications and materials science, 2010-01, Vol.207 (1), p.117-123 [Periódico revisado por pares]Berlin: WILEY-VCH VerlagTexto completo disponível |
5 |
Material Type: Artigo
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Cathodoluminescence of SiOx under-stoichiometric silica layersSalh, Roushdey ; von Czarnowski, A. ; Zamoryanskaya, M. V. ; Kolesnikova, E. V. ; Fitting, H.-J.Physica status solidi. A, Applications and materials science, 2006-06, Vol.203 (8), p.2049-2057 [Periódico revisado por pares]Berlin: WILEY-VCH VerlagTexto completo disponível |
6 |
Material Type: Artigo
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Soft X-ray emission spectroscopy of low-dimensional SiO2/Si interfaces after Si+ ion implantation and ion beam mixingZatsepin, D. A. ; Kaschieva, S. ; Zier, M. ; Schmidt, B. ; Fitting, H.-J.Physica status solidi. A, Applications and materials science, 2010-03, Vol.207 (3), p.743-747 [Periódico revisado por pares]Berlin: WILEY-VCH VerlagTexto completo disponível |
7 |
Material Type: Artigo
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Luminescence of isoelectronically ion-implanted SiO2 layersSalh, Roushdey ; Fitting Kourkoutis, L. ; Schmidt, B. ; Fitting, H.-J.Physica status solidi. A, Applications and materials science, 2007-09, Vol.204 (9), p.3132-3144 [Periódico revisado por pares]Berlin: WILEY-VCH VerlagTexto completo disponível |
8 |
Material Type: Artigo
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Multimodal luminescence spectra of ion-implanted silicaFitting, H.-J. ; Salh, Roushdey ; Barfels, T. ; Schmidt, B.Physica status solidi. A, Applications and materials science, 2005-10, Vol.202 (13), p.R142-R144 [Periódico revisado por pares]Berlin: WILEY-VCH VerlagTexto completo disponível |
9 |
Material Type: Artigo
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Mechanism of radiation-induced defects in SiO2: The role of hydrogenSalh, Roushdey ; Fitting, H.-J.Physica status solidi. C, 2007-03, Vol.4 (3), p.901-904 [Periódico revisado por pares]Berlin: WILEY-VCH VerlagTexto completo disponível |
10 |
Material Type: Artigo
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Multiplet luminescence of sulfur implanted silica - SiO2:SSalh, Roushdey ; Schmidt, B. ; Fitting, H.-J.Physica status solidi. A, Applications and materials science, 2005-04, Vol.202 (5), p.R53-R55 [Periódico revisado por pares]Weinheim: WILEY-VCH VerlagTexto completo disponível |