Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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PECVD Chamber Cleaning End Point Detection (EPD) Using Optical Emission Spectroscopy DataLee, Ho Jae ; Seo, Dongsun ; Hong, Sang Jeen ; May, Gary S.Transactions on Electrical and Electronic Materials, 2013, 14(5), , pp.254-257 [Periódico revisado por pares]한국전기전자재료학회Texto completo disponível |
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Material Type: Artigo
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Study of plasma characteristics for KOMAC microwave ion source using optical emission spectroscopyKim Dae-Il ; Jo Mun-Ho ; Lee Sang-Hun ; Kim Yu-SeokJournal of the Korean Physical Society, 2023-02, p.257-262 [Periódico revisado por pares]한국물리학회Texto completo disponível |
3 |
Material Type: Artigo
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Hard X-ray von Hamos Spectrometer for Single-Pulse Emission SpectroscopyMuhammad Ijaz Anwar ; Sung Soo Ha ; Byung-Jun Hwang ; Seonghyun Han ; Maverick S. H. Oh ; Mohd Faiyaz ; Do Young Noh ; Hyon Chol Kang ; Sunam KimJournal of the Korean Physical Society, 2019-10, p.494-497 [Periódico revisado por pares]한국물리학회Texto completo disponível |
4 |
Material Type: Artigo
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In-situ Virtual Metrology for the Silicon-dioxide Etch Rate by Using Optical Emission Spectroscopy DataBoomsoo Kim ; 홍상진Journal of the Korean Physical Society, 2014-07, p.168-175 [Periódico revisado por pares]한국물리학회Texto completo disponível |
5 |
Material Type: Artigo
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Measurements of plasma parameters in capacitively coupled radio frequency plasma from discharge characteristics: Correlation with optical emission spectroscopyB. Bora ; H. Bhuyan ; M. Favre ; E. Wyndham ; H. Chuaqui ; C.S. WongCurrent applied physics, 2013-09, p.1448-1453 [Periódico revisado por pares]한국물리학회Texto completo disponível |
6 |
Material Type: Artigo
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Statistical Analysis of the Emission Intensity for Silicon-Dioxide Etching Using Optical Emission Spectroscopy Data박진수 ; 서동선 ; 김현욱 ; 홍상진Journal of the Korean Physical Society, 2009-11, p.1873-1876 [Periódico revisado por pares]한국물리학회Texto completo disponível |
7 |
Material Type: Artigo
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Emission Spectroscopy Combined with a Single and a Double Probe in Low-pressure Inductively-coupled Nitrogen-Argon PlasmasJae Min Park ; Min A Song ; 정태훈Journal of the Korean Physical Society, 2012-08, p.376-386 [Periódico revisado por pares]한국물리학회Texto completo disponível |
8 |
Material Type: Artigo
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Use of In-Situ Optical Emission Spectroscopy for Leak Fault Detection and Classification in Plasma EtchingLee, Ho Jae ; Seo, Dong-Sun ; May, Gary S ; Hong, Sang JeenJournal of semiconductor technology and science, 2013, Vol.13 (4), p.395-401Texto completo disponível |
9 |
Material Type: Artigo
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Regular Papers : Actinometric Investigation of In-Situ Optical Emission Spectroscopy Data in SiO2 Plasma EtchBoom Soo Kim ; Sang Jeen HongTransactions on electrical and electronic materials, 2012-06, Vol.13 (3), p.139 [Periódico revisado por pares]한국전기전자재료학회Texto completo disponível |
10 |
Material Type: Artigo
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Actinometric Investigation of In-Situ Optical Emission Spectroscopy Data in SiO 2 Plasma EtchKim, Boom-Soo ; Hong, Sang-JeenTransactions on electrical and electronic materials, 2012, Vol.13 (3), p.139-143 [Periódico revisado por pares]Texto completo disponível |