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The elusive memristor: properties of basic electrical circuits
The elusive memristor: properties of basic electrical circuits
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The elusive memristor: properties of basic electrical circuits

Joglekar, Yogesh N ; Wolf, Stephen J

European journal of physics, 2009-07, Vol.30 (4), p.661-675 [Periódico revisado por pares]

Bristol: IOP Publishing

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Teledyne Imaging Sensors : Infrared imaging technologies for Astronomy & Civil Space
Teledyne Imaging Sensors : Infrared imaging technologies for Astronomy & Civil Space
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Teledyne Imaging Sensors : Infrared imaging technologies for Astronomy & Civil Space

BELETIC, James W ; BLANK, Richard ; GULBRANSEN, David ; LEE, Donald ; LOOSE, Markus ; PIQUETTE, Eric C ; SPRAFKE, Thomas ; TENNANT, William E ; ZANDIAN, Majid ; ZINO, Joseph

Proceedings of SPIE, the International Society for Optical Engineering, 2008, Vol.7021, p.70210H.1-70210H.14

Bellingham, Wash: SPIE

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3
A Holistic Metrology Approach: Hybrid Metrology Utilizing Scatterometry, CD-AFM and CD-SEM
A Holistic Metrology Approach: Hybrid Metrology Utilizing Scatterometry, CD-AFM and CD-SEM
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A Holistic Metrology Approach: Hybrid Metrology Utilizing Scatterometry, CD-AFM and CD-SEM

VAID, Alok ; BIN BIN YAN ; YUN TAO JIANG ; KELLING, Mark

Proceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.7971

Bellingham, Wash: SPIE

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4
Gridded Design Rule Scaling: Taking the CPU toward the 16nm node
Gridded Design Rule Scaling: Taking the CPU toward the 16nm node
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Gridded Design Rule Scaling: Taking the CPU toward the 16nm node

BENCHER, Christopher ; DAI, Huixiong ; YONGMEI CHEN

Proceedings of SPIE, the International Society for Optical Engineering, 2009, Vol.7274

Bellingham, Wash: SPIE

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5
Experimental Result and Simulation Analysis for the use of Pixelated Illumination from Source Mask Optimization for 22nm Logic Lithography Process
Experimental Result and Simulation Analysis for the use of Pixelated Illumination from Source Mask Optimization for 22nm Logic Lithography Process
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Experimental Result and Simulation Analysis for the use of Pixelated Illumination from Source Mask Optimization for 22nm Logic Lithography Process

KAFAI LAI ; ROSENBLUTH, Alan E ; MCLNTYRE, Greg ; WAGNER, Alfred ; BURR, Geoffrey ; BURKHARDT, Martin ; CORLISS, Daniel ; GALLAGHER, Emily ; FAURE, Tom ; HIBBS, Michael ; FLAGELLO, Donis ; ZIMMERMANN, Joerg ; BAGHERI, Saeed ; KNEER, Bernhard ; ROHMUND, Frank ; HARTUNG, Frank ; HENNERKES, Christoph ; MAUL, Manfred ; KAZINCZI, Robert ; ENGELEN, Andrew ; CARPAIJ, Rene ; GROENENDIJK, Remco ; HAGEMAN, Joost ; HOFFNAGLE, John ; TIAN, Kehan ; MELVILLE, David ; TIRAPU-AZPIROZ, Jaione ; FAKHRY, Moutaz ; KIM, Young ; HALLE, Scott

Proceedings of SPIE, the International Society for Optical Engineering, 2009, Vol.7274

Bellingham, Wash: SPIE

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6
Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems
Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems
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Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems

Mulder, Melchior ; Engelen, André ; Noordman, Oscar ; Streutker, Gert ; van Drieenhuizen, Bert ; van Nuenen, Cas ; Endendijk, Wilfred ; Verbeeck, Jef ; Bouman, Wim ; Bouma, Anita ; Kazinczi, Robert ; Socha, Robert ; Jürgens, Dirk ; Zimmermann, Joerg ; Trauter, Bastian ; Bekaert, Joost ; Laenens, Bart ; Corliss, Daniel ; McIntyre, Greg

Proceedings of SPIE, the International Society for Optical Engineering, 2010, Vol.7640, p.76401P-76401P-10

Bellingham, Wash: SPIE

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7
Development of an inorganic photoresist for DUV, EUV, and electron beam imaging
Development of an inorganic photoresist for DUV, EUV, and electron beam imaging
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Development of an inorganic photoresist for DUV, EUV, and electron beam imaging

TRIKERIOTIS, Markos ; WOO JIN BAE ; SCHWARTZ, Evan ; KRYSAK, Marie ; LAFFERTY, Neal ; PENG XIE ; SMITH, Bruce ; ZIMMERRNAN, Paul ; OBER, Christopher K ; GIANNELIS, Emmanuel P

Proceedings of SPIE, the International Society for Optical Engineering, 2010, Vol.7639

Bellingham, Wash: SPIE

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8
A low-cost computer-controlled Arduino-based educational laboratory system for teaching the fundamentals of photovoltaic cells
A low-cost computer-controlled Arduino-based educational laboratory system for teaching the fundamentals of photovoltaic cells
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A low-cost computer-controlled Arduino-based educational laboratory system for teaching the fundamentals of photovoltaic cells

Zachariadou, K ; Yiasemides, K ; Trougkakos, N

European journal of physics, 2012-11, Vol.33 (6), p.1599-1610 [Periódico revisado por pares]

Bristol: IOP Publishing

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9
Effects of Radiation on MEMS
Effects of Radiation on MEMS
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Effects of Radiation on MEMS

SHEA, Herbert R

Proceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.7928

Bellingham, Wash: SPIE

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10
What your visual system sees where you are not looking
What your visual system sees where you are not looking
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What your visual system sees where you are not looking

ROSENHOLTZ, Ruth

Proceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.7865

Springfield, Va: IS&T

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