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Refinado por: Nome da Publicação: Japanese Journal Of Applied Physics remover idioma: Japonês remover
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Silicon bulk growth for solar cells: Science and technology
Silicon bulk growth for solar cells: Science and technology
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Silicon bulk growth for solar cells: Science and technology

Kakimoto, Koichi ; Gao, Bing ; Nakano, Satoshi ; Harada, Hirofumi ; Miyamura, Yoshiji

Japanese Journal of Applied Physics, 2017-02, Vol.56 (2), p.20101-020101 [Periódico revisado por pares]

The Japan Society of Applied Physics

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2
Dielectric Thin Films for Future Electron Devices: Science and Technology
Dielectric Thin Films for Future Electron Devices: Science and Technology
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Dielectric Thin Films for Future Electron Devices: Science and Technology

Watanabe, Heiji ; Nara, Yasuo ; Kamakura, Yoshinari

Japanese Journal of Applied Physics, 2018-06, Vol.57 (6S3), p.6 [Periódico revisado por pares]

Tokyo: The Japan Society of Applied Physics

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3
Material science and device physics in SiC technology for high-voltage power devices
Material science and device physics in SiC technology for high-voltage power devices
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Material science and device physics in SiC technology for high-voltage power devices

Kimoto, Tsunenobu

Japanese Journal of Applied Physics, 2015-04, Vol.54 (4), p.40103-1-040103-27 [Periódico revisado por pares]

The Japan Society of Applied Physics

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4
Basic study on estimation method of wall shear stress in common carotid artery using blood flow imaging
Basic study on estimation method of wall shear stress in common carotid artery using blood flow imaging
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Basic study on estimation method of wall shear stress in common carotid artery using blood flow imaging

Nagaoka, Ryo ; Ishikawa, Kazuma ; Mozumi, Michiya ; Cinthio, Magnus ; Hasegawa, Hideyuki

Japanese Journal of Applied Physics, 2020-07, Vol.59 (SK), p.SKKE16 [Periódico revisado por pares]

IOP Publishing

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5
Dielectric Thin Films for Future Electron Devices: Science and Technology
Dielectric Thin Films for Future Electron Devices: Science and Technology
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Dielectric Thin Films for Future Electron Devices: Science and Technology

Japanese Journal of Applied Physics, 2016-08, Vol.55 (8S2), p.8 [Periódico revisado por pares]

The Japan Society of Applied Physics

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6
Review of plasma-based water treatment technologies for the decomposition of persistent organic compounds
Review of plasma-based water treatment technologies for the decomposition of persistent organic compounds
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Review of plasma-based water treatment technologies for the decomposition of persistent organic compounds

Takeuchi, Nozomi ; Yasuoka, Koichi

Japanese Journal of Applied Physics, 2021-01, Vol.60 (SA), p.SA0801 [Periódico revisado por pares]

Tokyo: IOP Publishing

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7
Dielectric Thin Films for Future Electron Devices: Science and Technology
Dielectric Thin Films for Future Electron Devices: Science and Technology
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Dielectric Thin Films for Future Electron Devices: Science and Technology

Japanese Journal of Applied Physics, 2014-08, Vol.53 (8S1), p.8 [Periódico revisado por pares]

The Japan Society of Applied Physics

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8
Current status of Ga2O3 power devices
Current status of Ga2O3 power devices
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Current status of Ga2O3 power devices

Higashiwaki, Masataka ; Murakami, Hisashi ; Kumagai, Yoshinao ; Kuramata, Akito

Japanese Journal of Applied Physics, 2016-12, Vol.55 (12) [Periódico revisado por pares]

The Japan Society of Applied Physics

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9
Magnetic anisotropy of the single-crystalline ferromagnetic insulator Cr2Ge2Te6
Magnetic anisotropy of the single-crystalline ferromagnetic insulator Cr2Ge2Te6
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Magnetic anisotropy of the single-crystalline ferromagnetic insulator Cr2Ge2Te6

Zhang, Xiao ; Zhao, Yuelei ; Song, Qi ; Jia, Shuang ; Shi, Jing ; Han, Wei

Japanese Journal of Applied Physics, 2016-03, Vol.55 (3) [Periódico revisado por pares]

The Japan Society of Applied Physics

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10
Evolution of corundum-structured III-oxide semiconductors: Growth, properties, and devices
Evolution of corundum-structured III-oxide semiconductors: Growth, properties, and devices
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Evolution of corundum-structured III-oxide semiconductors: Growth, properties, and devices

Fujita, Shizuo ; Oda, Masaya ; Kaneko, Kentaro ; Hitora, Toshimi

Japanese Journal of Applied Physics, 2016-12, Vol.55 (12), p.1202 [Periódico revisado por pares]

The Japan Society of Applied Physics

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