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Japanese Journal Of Applied Physics
| Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
|---|---|---|---|
| 1 |
Material Type: Artigo
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Highly selective SiO2 etch employing inductively coupled hydro-fluorocarbon plasma chemistry for self aligned contact etchIIJIMA, Y ; ISHIKAWA, Y ; YANG, C.-I ; CHANG, M ; OKANO, HJapanese journal of applied physics, 1997, Vol.36 (9A), p.5498-5501 [Periódico revisado por pares]Tokyo: Japanese journal of applied physicsTexto completo disponível |
| 2 |
Material Type: Artigo
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In-plane aligned Y1Ba2Cu3O7-x tapes on metallic substrate by chemical vapor deposition techniqueYAMAGUCHI, T ; IIJIMA, Y ; HIRANO, N ; NAGAYA, S ; KOHNO, OJapanese journal of applied physics, 1994-11, Vol.33 (11), p.6150-6156 [Periódico revisado por pares]Tokyo: Japanese journal of applied physicsTexto completo disponível |
| 3 |
Material Type: Artigo
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Analysis of polyethyleneterephthalate film surface sputtered with Ar neutral and Ar ion beamsIIJIMA, Y ; SATO, T ; HIRAOKA, KJapanese Journal of Applied Physics, 1994-11, Vol.33 (11), p.6325-6330 [Periódico revisado por pares]Tokyo: Japanese journal of applied physicsTexto completo disponível |
| 4 |
Material Type: Artigo
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Segregation of As on GaAs(100) surface during abrasion process studied by X-ray photoelectron spectroscopy and Auger electron spectroscopyIIJIMA, Y ; MURAMOTO, K ; UEMURA, M ; HIRAOKA, KJapanese Journal of Applied Physics, 1993-11, Vol.32 (11A), p.5080-5084 [Periódico revisado por pares]Tokyo: Japanese journal of applied physicsTexto completo disponível |
| 5 |
Material Type: Artigo
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Determination of the frequency dependence of complex permittivity in the pseudo-microwave range by an advanced perturbation methodTAKAHASHI, T ; IIJIMA, Y ; KOBAYASHI, M ; MIURA, TJapanese Journal of Applied Physics, 1994, Vol.33 (9B), p.5510-5513 [Periódico revisado por pares]Tokyo: Japanese journal of applied physicsTexto completo disponível |
| 6 |
Material Type: Artigo
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Transport properties in InP/InAlAs type II single heterostructureMATSUI, H ; NARUSHIMA, M ; IIJIMA, Y ; KAWAMURA, Y ; INOUE, N ; IWAMURA, H ; ENDO, S ; UOZAKI, H ; TOYOTA, NJapanese Journal of Applied Physics, 1997-08, Vol.36 (8B), p.L1085-L1088 [Periódico revisado por pares]Tokyo: Japanese journal of applied physicsTexto completo disponível |
| 7 |
Material Type: Artigo
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HIGH JC Y-BA-CU-O THIN-FILM ON METAL SUBSTRATES PREPARED BY CHEMICAL VAPOR-DEPOSITIONAOKI, S ; YAMAGUCHI, T ; IIJIMA, Y ; KAGAWA, A ; KOHNO, O ; NAGAYA, S ; INOUE, TJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1992-05, Vol.31 (5A), p.L547-L549 [Periódico revisado por pares]MINATO-KU TOKYO: JAPAN J APPLIED PHYSICSTexto completo disponível |
| 8 |
Material Type: Artigo
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Thickness Dependence of the Thermoelectromotive Force in Evaporated Bi and Sb FilmsKoike, Ryutaro ; Kurokawa, Hiroyuki ; Iijima, YasukiJapanese Journal of Applied Physics, 1968-01, Vol.7 (3), p.293 [Periódico revisado por pares]Texto completo disponível |
| 9 |
Material Type: Artigo
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Preparation of carbon nanotubes by arc-discharge evaporationANDO, Y ; IIJIMA, SJapanese Journal of Applied Physics, 1993, Vol.32 (1A/B), p.L107-L109 [Periódico revisado por pares]Tokyo: Japanese journal of applied physicsTexto completo disponível |
| 10 |
Material Type: Artigo
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Joining Process of Ultrasonic Ceramic JoiningIijima, Mitsuo ; Watanabe, YujiJapanese Journal of Applied Physics, 2003, Vol.42 (Part 1, No. 5B), p.2986-2989 [Periódico revisado por pares]Texto completo disponível |
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