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1
Interlayer dielectric process for LSI circuits using positive photosensitive polyimide synthesized by block-copolymerization
Interlayer dielectric process for LSI circuits using positive photosensitive polyimide synthesized by block-copolymerization
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Interlayer dielectric process for LSI circuits using positive photosensitive polyimide synthesized by block-copolymerization

Aoyagi, Masahiro ; Segawa, Shigemasa ; Jung, EunSil ; Itatani, Taro ; Komuro, Masanori ; Sakamoto, Tsuenenori ; Itatani, Hiroshi ; Miyamura, Masataka ; Matsumoto, Shunichi

SPIE proceedings series, 2001, Vol.4345, p.1073-1078

Bellingham WA: SPIE

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2
Optically pumped stimulated emission in ZnO/ZnMgO multiple quantum wells prepared by combinatorial techniques
Optically pumped stimulated emission in ZnO/ZnMgO multiple quantum wells prepared by combinatorial techniques
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Optically pumped stimulated emission in ZnO/ZnMgO multiple quantum wells prepared by combinatorial techniques

Sun, Handong ; Makino, Takayuki ; Nguyen, Tien T ; Segawa, Yusaburo ; Tang, ZiKang ; Wong, George K ; Kawasaki, Masashi ; Ohtomo, Akira ; Tamura, Kentaro ; Koinuma, Hideomi

SPIE proceedings series, 2001, Vol.4281, p.68-76

Bellingham WA: SPIE

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3
Well-width dependence of exciton-phonon coupling strength in ZnO/(Mg,Zn)O multiple quantum wells grown by combinatorial laser molecular beam epitaxy
Well-width dependence of exciton-phonon coupling strength in ZnO/(Mg,Zn)O multiple quantum wells grown by combinatorial laser molecular beam epitaxy
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Well-width dependence of exciton-phonon coupling strength in ZnO/(Mg,Zn)O multiple quantum wells grown by combinatorial laser molecular beam epitaxy

Makino, Takayuki ; Sun, Handong ; Nguyen, Tien T ; Segawa, Yusaburo ; Chia, Chinhau ; Kawasaki, Masashi ; Ohtomo, Akira ; Tamura, Kentaro ; Koinuma, Hideomi

SPIE proceedings series, 2001, Vol.4281, p.59-67

Bellingham WA: SPIE

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4
Fabrication and tests of a MEMS-based double-beam cantilever flow sensor with clarifying of temperature effect
Fabrication and tests of a MEMS-based double-beam cantilever flow sensor with clarifying of temperature effect
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Fabrication and tests of a MEMS-based double-beam cantilever flow sensor with clarifying of temperature effect

Pang, Junguo ; Segawa, Takehiko ; Ikehara, Tsuyoshi ; Yoshida, Hiro ; Kikushima, Yoshihiro ; Abe, Hiroyuki ; Meada, Ryutaro

SPIE proceedings series, 2005, Vol.5649, p.253-264

Bellingham WA: SPIE

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5
Performance of a chemically amplified positive resist for next-generation photomask fabrication
Performance of a chemically amplified positive resist for next-generation photomask fabrication
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Performance of a chemically amplified positive resist for next-generation photomask fabrication

Kurihara, Masa-aki ; Segawa, Toshikazu ; Okuno, Daichi ; Hayashi, Naoya ; Sano, Hisatake

SPIE proceedings series, 1998, Vol.3412, p.279-291

Bellingham WA: SPIE

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6
Influence of the c-axis orientation on the optical properties of thin CdS films formed by laser ablation
Influence of the c-axis orientation on the optical properties of thin CdS films formed by laser ablation
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Influence of the c-axis orientation on the optical properties of thin CdS films formed by laser ablation

DUSHKINA, N. M ; ULLRICH, B ; SAKAI, H ; EIJU, T ; SEGAWA, Y

SPIE proceedings series, 1999, p.424-432

Bellingham WA: SPIE

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7
Performance of positive tone chemically amplified resists for next generation photomask fabrication
Performance of positive tone chemically amplified resists for next generation photomask fabrication
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Performance of positive tone chemically amplified resists for next generation photomask fabrication

SEGAWA, T ; KURIHARA, M.-A ; SASAKI, S ; INOMATA, H ; HAYASHI, N ; SANO, H

SPIE proceedings series, 1998, p.82-93

Bellingham WA: SPIE

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