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11-Megapixel CMOS-Integrated SiGe Micromirror Arrays for High-End Applications
11-Megapixel CMOS-Integrated SiGe Micromirror Arrays for High-End Applications
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11-Megapixel CMOS-Integrated SiGe Micromirror Arrays for High-End Applications

Witvrouw, A. ; Haspeslagh, L. ; Pedreira, O.V. ; De Coster, J. ; De Wolf, I. ; Tilmans, H.A.C. ; Bearda, T. ; Schlatmann, B. ; van Bommel, M. ; de Nooijer, M.-C. ; Magnee, P.H.C. ; Lous, E.J. ; Hagting, M. ; Lauria, J. ; Vanneer, R. ; van Drieenhuizen, B.

Journal of microelectromechanical systems, 2010-02, Vol.19 (1), p.202-214 [Periódico revisado por pares]

New York, NY: IEEE

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"On-glass" process option for BiCMOS technology
"On-glass" process option for BiCMOS technology
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"On-glass" process option for BiCMOS technology

Aksen, E. ; van Noort, W.D. ; Bower, D. ; Bell, N. ; Dekker, R. ; de Boer, W. ; Rodriguez, A. ; Deixler, P. ; Havens, R.J. ; Magnee, P.H.C.

Bipolar/BiCMOS Circuits and Technology, 2004. Proceedings of the 2004 Meeting, 2004, p.64-67

Piscataway NJ: IEEE

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3
Analysis of superconducting Sn/Ti contacts to GaAs/AlGaAs heterostructures by electron focusing
Analysis of superconducting Sn/Ti contacts to GaAs/AlGaAs heterostructures by electron focusing
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Analysis of superconducting Sn/Ti contacts to GaAs/AlGaAs heterostructures by electron focusing

Gao, J R ; Kerkhof, J J B ; Verwerft, M ; Magnée, P ; Wees, B J van ; Klapwijk, T M ; Hosson, J Th M De

Semiconductor science and technology, 1996-04, Vol.11 (4), p.L621-624 [Periódico revisado por pares]

Bristol: IOP Publishing

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4
A new sub-micron 24 V SiGe:C resurf HBT
A new sub-micron 24 V SiGe:C resurf HBT
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A new sub-micron 24 V SiGe:C resurf HBT

MELAI, J ; MAGNEE, P. H. C ; HUETING, R. J. E ; NEUILLY, F. I ; DE KORT, R ; SLOTBOOM, J. W

2004 Proceedings of the 16th International Symposium on Power Semiconductor Devices and ICs, 2004, p.33-36

Tokyo: IEEE

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5
Metal emitter SiGe:C HBTs
Metal emitter SiGe:C HBTs
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Metal emitter SiGe:C HBTs

Donkers, J.J.T.M. ; Vanhoucke, T. ; Agarwal, P. ; Hueting, R.J.E. ; Meunier-Beillard, P. ; Vijayaraghavan, M.N. ; Magnee, P.H.C. ; Verheijen, M.A. ; de Kort, R. ; Slotboom, J.W.

IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004, 2004, p.243-246

Piscataway NJ: IEEE

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QUBiC4X : An fT/fmax=130/140GHz SiGe:C-BiCMOS manufacturing technology with elite passives for emerging microwave applications
QUBiC4X : An fT/fmax=130/140GHz SiGe:C-BiCMOS manufacturing technology with elite passives for emerging microwave applications
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QUBiC4X : An fT/fmax=130/140GHz SiGe:C-BiCMOS manufacturing technology with elite passives for emerging microwave applications

DEIXLER, P ; RODRIGUEZ, A ; HURKX, G. A. M ; TIEMEIJER, L. F ; PAASSCHENS, J. C. J ; HUIZING, H. G. A ; HARTSKEERL, D. M. H ; AGARWAL, P ; MAGNEE, P. H. C ; AKSEN, E ; SLOTBOOM, J. W ; DE BOER, W ; SUN, H ; COLCLASER, R ; BOWER, D ; BELL, N ; YAO, A ; BROCK, R ; BOUTTEMENT, Y

Piscataway NJ: IEEE 2004

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