Polymeric photosensitizers based on thioxanthone photodegradation study of poly(alkylmethacrylates)
Miguel Guillermo Neumann Carla Cristina Schmitt Cavalheiro; Ricardo Escriptório; Letícia F. A Pinto; Beatriz E Goi; International Conference on Photochemistry (24. 2009 Toledo)
Book of abstracts Toledo : University of Castilla la Mancha, 2009
Toledo University of Castilla la Mancha 2009
Localização:
IQSC - Inst. Química de São Carlos
(P11966 ) e outros locais(Acessar)
Photopolymerization of methyl methacrylate sensitized by macrophotoinitiators in the presence of co-initiator
Ricardo A. Escriptório Beatriz Eleutério Goi; Carla Cristina Schmitt Cavalheiro; Miguel Guillermo Neumann; International Conference on Photochemistry (24. 2009 Toledo)
Book of abstracts Toledo : University of Castilla la Mancha, 2009
Toledo University of Castilla la Mancha 2009
Localização:
IQSC - Inst. Química de São Carlos
(P11965 ) e outros locais(Acessar)
Photodegradation of poly(alkyl methacrylates) containing macroinitiators based on thioxanthone
L. F. A. Pinto B. E Goi; Miguel Guillermo Neumann; Carla Cristina Schmitt Cavalheiro; International Conference on Frontiers of Polymers and Advanced Materials - ICFPAM (10. 2009 Santiago de Chile)
Book of abstracts Santiago de Chile : Universidad de Chile, 2009
Santiago de Chile Universidad de Chile 2009
Localização:
IQSC - Inst. Química de São Carlos
(P11636 ) e outros locais(Acessar)