skip to main content
Mostrar Somente
Result Number Material Type Add to My Shelf Action Record Details and Options
1
Epitaxial growth and magnetic properties of Fe films on Si substrates
Material Type:
Artigo
Adicionar ao Meu Espaço

Epitaxial growth and magnetic properties of Fe films on Si substrates

Yaegashi, S. ; Kurihara, T. ; Sato, K. ; Segawa, H.

IEEE transactions on magnetics, 1994-11, Vol.30 (6), p.4836-4838

IEEE

Texto completo disponível

2
Vertically high-density interconnection for mobile application
Material Type:
Artigo
Adicionar ao Meu Espaço

Vertically high-density interconnection for mobile application

Katahira, Takayoshi ; Kartio, Ilkka ; Segawa, Hiroshi ; Takahashi, Michimasa ; Sagisaka, Katsumi

Microelectronics and reliability, 2006-05, Vol.46 (5), p.756-762 [Periódico revisado por pares]

Oxford: Elsevier Ltd

Texto completo disponível

3
Optical properties of excitons in ZnO-based quantum well heterostructures
Material Type:
Artigo
Adicionar ao Meu Espaço

Optical properties of excitons in ZnO-based quantum well heterostructures

Makino, T ; Segawa, Y ; Kawasaki, M ; Koinuma, H

Semiconductor science and technology, 2005-04, Vol.20 (4), p.S78-S91 [Periódico revisado por pares]

IOP Publishing

Texto completo disponível

4
Extended Transmission Reach Using Optical Filtering of Frequency-Modulated Widely Tunable SSG-DBR Laser
Material Type:
Artigo
Adicionar ao Meu Espaço

Extended Transmission Reach Using Optical Filtering of Frequency-Modulated Widely Tunable SSG-DBR Laser

Matsuo, S. ; Kakitsuka, T. ; Segawa, T. ; Fujiwara, N. ; Shibata, Y. ; Oohashi, H. ; Yasaka, H. ; Suzuki, H.

IEEE photonics technology letters, 2008-02, Vol.20 (4), p.294-296

New York: IEEE

Texto completo disponível

5
Measurements of the quantized hall resistance at ETL
Material Type:
Artigo
Adicionar ao Meu Espaço

Measurements of the quantized hall resistance at ETL

Kinoshita, J. ; Nishinaka, H. ; Segawa, K. ; Van Degrift, C.T. ; Tadashi Endo

IEEE transactions on instrumentation and measurement, 1991-04, Vol.40 (2), p.249-252 [Periódico revisado por pares]

New York, NY: IEEE

Texto completo disponível

Personalize Seus Resultados

  1. Editar

Refine Search Results

Expandir Meus Resultados

  1.   

Mostrar Somente

  1. Revistas revisadas por pares (3)

Buscando em bases de dados remotas. Favor aguardar.