Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
---|---|---|---|
1 |
Material Type: Ata de Congresso
|
![]() |
Impact on mask technology from the viewpoint of DRAM trendKoyama, KuniakiSPIE proceedings series, 1998, Vol.3412, p.10-17Bellingham WA: SPIETexto completo disponível |
2 |
Material Type: Ata de Congresso
|
![]() |
A novel high performance planar InGaAs/InAlAs avalanche photodiodeLevine, B. F ; Sacks, R. N ; Ko, J ; Jazwiecki, M ; Valdmanis, J. A ; Gunther, D ; Meier, J. H Luo, Yi ; Lee, Yong Hee ; Koyama, FumioProceedings of SPIE, the International Society for Optical Engineering, 2006, Vol.6352, p.63521D-63521D-7Bellingham WA: SPIETexto completo disponível |
3 |
Material Type: Ata de Congresso
|
![]() |
Advanced FIB mask repair technology for Arf lithography (3)HAGIWARA, Ryoji ; YASAKA, Anto ; AITA, Kazuo ; ADACHI, Tatsuya ; KUBO, Shinji ; YOSHIOKA, Nobuyuki ; MORIMOTO, Hiroaki ; MORIKAWA, Yasutaka ; IWASE, Kazuya ; HAYASHI, Naoya ; TAKAOKA, Osamu ; KOZAKAI, Tomokazu ; YABE, Satoru ; KOYAMA, Yoshihiro ; MURAMATSU, Masashi ; DOI, Toshio ; SUZUKI, Katsumi ; OKABE, MamoruSPIE proceedings series, 2001, p.555-562Bellingham WA: SPIETexto completo disponível |
4 |
Material Type: Ata de Congresso
|
![]() |
Advanced FIB mask repair technology for 100nm/ArF lithography (2)HAGIWARA, Ryoji ; YASAKA, Anto ; MATSUDA, Osamu ; OKABE, Mamoru ; SHINOHARA, Shoji ; HASUDA, Masakatsu ; ADACHI, Tatsuya ; MORIKAWA, Yasutaka ; NISHIGUCHI, Masaharu ; SATO, Yasushi ; HAYASHI, Naoya ; OZAWA, Toshiya ; AITA, Kazuo ; TANAKA, Yoshihiro ; YOSHIOKA, Nobuyuki ; TAKAOKA, Osamu ; KOYAMA, Yoshihiro ; KOZAKAI, Tomokazu ; DOI, Toshio ; MURAMATSU, Masashi ; SUZUKI, Katsumi ; SUGIYAMA, YasuhikoSPIE proceedings series, 2003, p.510-519Bellingham WA: SPIETexto completo disponível |
5 |
Material Type: Artigo
|
![]() |
A novel birefringent distributed Bragg reflector using a metal/dielectric polarizer for polarization control of surface-emitting lasersMUKAIHARA, T ; OHNOKI, N ; BABA, T ; KOYAMA, F ; IGA, KJapanese Journal of Applied Physics, 1994, Vol.33 (2B), p.L227-L229 [Periódico revisado por pares]Tokyo: Japanese journal of applied physicsTexto completo disponível |