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Refinado por: assunto: Thin Films remover assunto: Vacuum Technology remover
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1
Surfaces, vacuum, and their applications Cancun, Mexico September, 1994
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Livro
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Surfaces, vacuum, and their applications Cancun, Mexico September, 1994

Isaac Hernández-Calderón; René Asomoza; American Institute of Physics; Latin American Congress on Surface Science and its Applications (8th 1994 Cancún, Mexico)

Woodbury, N.Y. AIP Press c1996

Localização: IF - Instituto de Física    (MS AIP v.378 )(Acessar)

2
Vacuum technology, thin films, and sputtering an introduction
Material Type:
Livro
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Vacuum technology, thin films, and sputtering an introduction

R. V. Stuart

New York Academic Press 1983

Localização: IF - Instituto de Física    (533.5 S932v ) e outros locais(Acessar)

3
Vacuum Refining of Molten Silicon
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Artigo
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Vacuum Refining of Molten Silicon

Safarian, Jafar ; Tangstad, Merete

Metallurgical and materials transactions. B, Process metallurgy and materials processing science, 2012-12, Vol.43 (6), p.1427-1445 [Periódico revisado por pares]

Boston: Springer US

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4
Effect of Adding Al on the Phase Structure and Gettering Performance of TiZrV Non-Evaporable Getter Materials
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Artigo
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Effect of Adding Al on the Phase Structure and Gettering Performance of TiZrV Non-Evaporable Getter Materials

Wang, Lulu ; Li, Yang ; Guo, Deyu ; Jin, Qingxi ; Zhang, Zhenbin ; Yang, Zhimin

Materials, 2024-05, Vol.17 (9), p.1969 [Periódico revisado por pares]

Switzerland: MDPI AG

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5
Mass Transfer of Phosphorus in Silicon Melts Under Vacuum Induction Refining
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Artigo
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Mass Transfer of Phosphorus in Silicon Melts Under Vacuum Induction Refining

Zheng, Song-Sheng ; Chen, Wen-Hui ; Cai, Jing ; Li, Jin-Tang ; Chen, Chao ; Luo, Xue-Tao

Metallurgical and materials transactions. B, Process metallurgy and materials processing science, 2010-12, Vol.41 (6), p.1268-1273 [Periódico revisado por pares]

Boston: Springer US

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6
Fabrication of Transparent and Conductive SWCNT/SiO2 Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films
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Fabrication of Transparent and Conductive SWCNT/SiO2 Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films

Ogawa, Naoki ; Nagai, Hiroki ; Kudoh, Yukihiro ; Onuma, Takeyoshi ; Murayama, Taichi ; Nojima, Akinobu ; Sato, Mitsunobu

Nanomaterials (Basel, Switzerland), 2021-12, Vol.11 (12), p.3404 [Periódico revisado por pares]

Basel: MDPI AG

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7
Microscale study of frictional properties of graphene in ultra high vacuum
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Artigo
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Microscale study of frictional properties of graphene in ultra high vacuum

Marchetto, Diego ; Feser, Tim ; Dienwiebel, Martin

Friction, 2015-06, Vol.3 (2), p.161-169 [Periódico revisado por pares]

Beijing: Tsinghua University Press

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8
Assessment of atomic layer deposited TiO2 photocatalytic self-cleaning by quartz crystal microbalance
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Assessment of atomic layer deposited TiO2 photocatalytic self-cleaning by quartz crystal microbalance

Henry, Théo ; Martins, Paolo ; Eustache, Etienne ; Servet, Bernard ; Divay, Laurent ; Jouanne, Pierre ; Grasset, Philippe ; Dudon, Jean-Paul ; Hugonnot, Patrick ; Fleury-Frenette, Karl

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-07, Vol.38 (4) [Periódico revisado por pares]

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9
Vacuum-Assisted Selective Adhesive Imprinting for Photonic Packaging of Complex MOEMS Devices: Assembly of Miniaturized Particle Sensor
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Vacuum-Assisted Selective Adhesive Imprinting for Photonic Packaging of Complex MOEMS Devices: Assembly of Miniaturized Particle Sensor

Pribosek, Jaka ; Zauner, Markus ; Bardong, Jochen ; Binder, Alfred ; Maierhofer, Paul ; Bergmann, Alexander ; Rohrer, Georg

IEEE sensors journal, 2020-12, Vol.20 (24), p.15053-15060 [Periódico revisado por pares]

New York: IEEE

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10
Mechanism of Calcium Fluoride Acceleration for Vacuum Carbothermic Reduction of Magnesia
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Mechanism of Calcium Fluoride Acceleration for Vacuum Carbothermic Reduction of Magnesia

Jiang, Yun ; Liu, Yu-qin ; Ma, Hong-wen ; Zhou, Wei-gong

Metallurgical and materials transactions. B, Process metallurgy and materials processing science, 2016-04, Vol.47 (2), p.837-845 [Periódico revisado por pares]

New York: Springer US

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