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Refinado por: Base de dados/Biblioteca: Gale Academic OneFile remover assunto: Materials Science remover
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1
Highly Active and Stable Pt–Pd Alloy Catalysts Synthesized by Room‐Temperature Electron Reduction for Oxygen Reduction Reaction
Highly Active and Stable Pt–Pd Alloy Catalysts Synthesized by Room‐Temperature Electron Reduction for Oxygen Reduction Reaction
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Highly Active and Stable Pt–Pd Alloy Catalysts Synthesized by Room‐Temperature Electron Reduction for Oxygen Reduction Reaction

Wang, Wei ; Wang, Zongyuan ; Wang, Jiajun ; Zhong, Chuan‐Jian ; Liu, Chang‐Jun

Advanced science, 2017-04, Vol.4 (4), p.1600486-n/a [Periódico revisado por pares]

Germany: John Wiley & Sons, Inc

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2
Effect of Atomic-Temperature Dependence of the Electron–Phonon Coupling in Two-Temperature Model
Effect of Atomic-Temperature Dependence of the Electron–Phonon Coupling in Two-Temperature Model
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Effect of Atomic-Temperature Dependence of the Electron–Phonon Coupling in Two-Temperature Model

Akhmetov, Fedor ; Medvedev, Nikita ; Makhotkin, Igor ; Ackermann, Marcelo ; Milov, Igor

Materials, 2022-07, Vol.15 (15), p.5193 [Periódico revisado por pares]

Basel: MDPI AG

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3
Aging-Resistant Behavior and Room Temperature Electron Spin Resonance of Nd3+ in Singly and Doubly Doped BaTiO3 Ceramics Associated with Preservation History
Aging-Resistant Behavior and Room Temperature Electron Spin Resonance of Nd3+ in Singly and Doubly Doped BaTiO3 Ceramics Associated with Preservation History
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Aging-Resistant Behavior and Room Temperature Electron Spin Resonance of Nd3+ in Singly and Doubly Doped BaTiO3 Ceramics Associated with Preservation History

Lu, Dayong ; Ji, Lv ; Liu, Junwei

Materials, 2019-02, Vol.12 (3), p.451 [Periódico revisado por pares]

Basel: MDPI AG

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4
On the Quenching of Electron Temperature in Inductively Coupled Plasma
On the Quenching of Electron Temperature in Inductively Coupled Plasma
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On the Quenching of Electron Temperature in Inductively Coupled Plasma

Seong, Inho ; Kim, Si-Jun ; Lee, Youngseok ; Cho, Chulhee ; Jeong, Wonnyoung ; You, Yebin ; Choi, Minsu ; Choi, Byeongyeop ; You, Shinjae

Materials, 2023-04, Vol.16 (8), p.3219 [Periódico revisado por pares]

Switzerland: MDPI AG

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5
Reduced Electron Temperature in Silicon Multi-Quantum-Dot Single-Electron Tunneling Devices
Reduced Electron Temperature in Silicon Multi-Quantum-Dot Single-Electron Tunneling Devices
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Reduced Electron Temperature in Silicon Multi-Quantum-Dot Single-Electron Tunneling Devices

Lee, Youngmin ; Lee, So Hyun ; Son, Hyo Seok ; Lee, Sejoon

Nanomaterials (Basel, Switzerland), 2022-02, Vol.12 (4), p.603 [Periódico revisado por pares]

Switzerland: MDPI AG

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6
Radiation Hardness of Silicon Carbide upon High-Temperature Electron and Proton Irradiation
Radiation Hardness of Silicon Carbide upon High-Temperature Electron and Proton Irradiation
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Radiation Hardness of Silicon Carbide upon High-Temperature Electron and Proton Irradiation

Lebedev, Alexander A. ; Kozlovski, Vitali V. ; Davydovskaya, Klavdia S. ; Levinshtein, Mikhail E.

Materials, 2021-08, Vol.14 (17), p.4976 [Periódico revisado por pares]

Basel: MDPI AG

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7
A high-temperature Auger electron spectrometer setup and its application to reactive wetting experiments at 1700 K
A high-temperature Auger electron spectrometer setup and its application to reactive wetting experiments at 1700 K
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A high-temperature Auger electron spectrometer setup and its application to reactive wetting experiments at 1700 K

Alphei, L. D. ; Dobbe, C. ; Becker, V. ; Becker, J. A.

Journal of materials science, 2015-04, Vol.50 (8), p.3175-3182 [Periódico revisado por pares]

Boston: Springer US

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8
One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma
One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma
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One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma

Yoon, Ho-Won ; Shin, Seung-Min ; Kwon, Seong-Yong ; Cho, Hyun-Min ; Kim, Sang-Gab ; Hong, Mun-Pyo

Materials, 2021-04, Vol.14 (8), p.2025 [Periódico revisado por pares]

Switzerland: MDPI AG

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9
Low Electron Temperature Plasma Diagnosis: Revisiting Langmuir Electrostatic Probes
Low Electron Temperature Plasma Diagnosis: Revisiting Langmuir Electrostatic Probes
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Low Electron Temperature Plasma Diagnosis: Revisiting Langmuir Electrostatic Probes

Regodón, Guillermo Fernando ; Díaz-Cabrera, Juan Manuel ; Fernández Palop, José Ignacio ; Ballesteros, Jerónimo

Coatings (Basel), 2021-10, Vol.11 (10), p.1158 [Periódico revisado por pares]

Basel: MDPI AG

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10
In Situ Room Temperature Electron-Beam Driven Graphene Growth from Hydrocarbon Contamination in a Transmission Electron Microscope
In Situ Room Temperature Electron-Beam Driven Graphene Growth from Hydrocarbon Contamination in a Transmission Electron Microscope
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In Situ Room Temperature Electron-Beam Driven Graphene Growth from Hydrocarbon Contamination in a Transmission Electron Microscope

Rummeli, Mark H ; Pan, Yumo ; Zhao, Liang ; Gao, Jing ; Ta, Huy Q ; Martinez, Ignacio G ; Mendes, Rafael G ; Gemming, Thomas ; Fu, Lei ; Bachmatiuk, Alicja ; Liu, Zhongfan

Materials, 2018-05, Vol.11 (6), p.896 [Periódico revisado por pares]

Switzerland: MDPI

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