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Effect of substrate temperature on properties of diamond-like films deposited by combined DC impulse vacuum-arc method
Effect of substrate temperature on properties of diamond-like films deposited by combined DC impulse vacuum-arc method
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Effect of substrate temperature on properties of diamond-like films deposited by combined DC impulse vacuum-arc method

Zavaleyev, V. ; Walkowicz, J. ; Greczynski, G. ; Hultman, L.

Surface & coatings technology, 2013-12, Vol.236, p.444-449 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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X-ray photoelectron spectroscopy studies of Ti1-xAlxN (0 ≤ x ≤ 0.83) high-temperature oxidation: The crucial role of Al concentration
X-ray photoelectron spectroscopy studies of Ti1-xAlxN (0 ≤ x ≤ 0.83) high-temperature oxidation: The crucial role of Al concentration
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X-ray photoelectron spectroscopy studies of Ti1-xAlxN (0 ≤ x ≤ 0.83) high-temperature oxidation: The crucial role of Al concentration

Greczynski, G. ; Hultman, L. ; Odén, M.

Surface & coatings technology, 2019-09, Vol.374, p.923-934 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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3
High power pulsed magnetron sputtered CrNx films
High power pulsed magnetron sputtered CrNx films
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High power pulsed magnetron sputtered CrNx films

Ehiasarian, A.P ; Münz, W.-D ; Hultman, L ; Helmersson, U ; Petrov, I

Surface & coatings technology, 2003-01, Vol.163-164, p.267-272 [Periódico revisado por pares]

Elsevier B.V

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4
Growth and properties of amorphous Ti–B–Si–N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB2 and Si targets
Growth and properties of amorphous Ti–B–Si–N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB2 and Si targets
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Growth and properties of amorphous Ti–B–Si–N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB2 and Si targets

Fager, H. ; Greczynski, G. ; Jensen, J. ; Lu, J. ; Hultman, L.

Surface & coatings technology, 2014-11, Vol.259, p.442-447 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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5
Incorporation effects of Si in TiCx thin films
Incorporation effects of Si in TiCx thin films
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Incorporation effects of Si in TiCx thin films

Tengstrand, O. ; Nedfors, N. ; Alling, B. ; Jansson, U. ; Flink, A. ; Eklund, P. ; Hultman, L.

Surface & coatings technology, 2014-11, Vol.258, p.392-397 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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6
A review of metal-ion-flux-controlled growth of metastable TiAlN by HIPIMS/DCMS co-sputtering
A review of metal-ion-flux-controlled growth of metastable TiAlN by HIPIMS/DCMS co-sputtering
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A review of metal-ion-flux-controlled growth of metastable TiAlN by HIPIMS/DCMS co-sputtering

Greczynski, G. ; Lu, J. ; Jensen, J. ; Bolz, S. ; Kölker, W. ; Schiffers, Ch ; Lemmer, O. ; Greene, J.E. ; Hultman, L.

Surface & coatings technology, 2014-10, Vol.257, p.15-25 [Periódico revisado por pares]

Elsevier B.V

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7
Influence of Si on the microstructure of arc evaporated (Ti,Si)N thin films; evidence for cubic solid solutions and their thermal stability
Influence of Si on the microstructure of arc evaporated (Ti,Si)N thin films; evidence for cubic solid solutions and their thermal stability
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Influence of Si on the microstructure of arc evaporated (Ti,Si)N thin films; evidence for cubic solid solutions and their thermal stability

Flink, A. ; Larsson, T. ; Sjölén, J. ; Karlsson, L. ; Hultman, L.

Surface & coatings technology, 2005-11, Vol.200 (5), p.1535-1542 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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8
Growth of hard amorphous Ti-Al-Si-N thin films by cathodic arc evaporation
Growth of hard amorphous Ti-Al-Si-N thin films by cathodic arc evaporation
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Growth of hard amorphous Ti-Al-Si-N thin films by cathodic arc evaporation

FAGER, H ; ANDERSSON, J. M ; LU, J ; JÖESAAR, M. P. Johansson ; ODEN, M ; HULTMAN, L

Surface & coatings technology, 2013-11, Vol.235 (25), p.376-382 [Periódico revisado por pares]

Amsterdam: Elsevier

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9
High Si content TiSiN films with superior oxidation resistance
High Si content TiSiN films with superior oxidation resistance
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High Si content TiSiN films with superior oxidation resistance

Greczynski, G. ; Bakhit, B. ; Hultman, L. ; Odén, M.

Surface & coatings technology, 2020-09, Vol.398, p.126087, Article 126087 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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10
Towards energy-efficient physical vapor deposition: Mapping out the effects of W+ energy and concentration on the densification of TiAlWN thin films grown with no external heating
Towards energy-efficient physical vapor deposition: Mapping out the effects of W+ energy and concentration on the densification of TiAlWN thin films grown with no external heating
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Towards energy-efficient physical vapor deposition: Mapping out the effects of W+ energy and concentration on the densification of TiAlWN thin films grown with no external heating

Li, X. ; Bakhit, B. ; Johansson Jõesaar, M.P. ; Petrov, I. ; Hultman, L. ; Greczynski, G.

Surface & coatings technology, 2021-10, Vol.424, p.127639, Article 127639 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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