Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Microstructural evolution during film growthPetrov, I. ; Barna, P. B. ; Hultman, L. ; Greene, J. E.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2003-09, Vol.21 (5), p.S117-S128 [Periódico revisado por pares]Texto completo disponível |
2 |
Material Type: Artigo
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Toughness enhancement in TiAlN-based quarternary alloysSangiovanni, D.G. ; Chirita, V. ; Hultman, L.Thin solid films, 2012-03, Vol.520 (11), p.4080-4088 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
3 |
Material Type: Artigo
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Reliable determination of chemical state in x-ray photoelectron spectroscopy based on sample-work-function referencing to adventitious carbon: Resolving the myth of apparent constant binding energy of the C 1s peakGreczynski, G. ; Hultman, L.Applied surface science, 2018-09, Vol.451, p.99-103 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
4 |
Material Type: Artigo
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Surface morphology effects on the light-controlled wettability of ZnO nanostructuresKHRANOVSKYY, V ; EKBLAD, T ; YAKIMOVA, R ; HULTMAN, LApplied surface science, 2012-08, Vol.258 (20), p.8146-8152 [Periódico revisado por pares]Amsterdam: ElsevierTexto completo disponível |
5 |
Material Type: Artigo
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Referencing to adventitious carbon in X-ray photoelectron spectroscopy: Can differential charging explain C 1s peak shifts?Greczynski, G. ; Hultman, L.Applied surface science, 2022-12, Vol.606, p.154855, Article 154855 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
6 |
Material Type: Artigo
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Thermal stability of nitride thin filmsHultman, LVacuum, 2000, Vol.57 (1), p.1-30 [Periódico revisado por pares]Elsevier LtdTexto completo disponível |
7 |
Material Type: Artigo
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Impact of sample storage type on adventitious carbon and native oxide growth: X-ray photoelectron spectroscopy studyGreczynski, G. ; Hultman, L.Vacuum, 2022-11, Vol.205, p.111463, Article 111463 [Periódico revisado por pares]Texto completo disponível |
8 |
Material Type: Artigo
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Mitigating the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputteringGreczynski, G. ; Jensen, J. ; Hultman, L.Thin solid films, 2011-07, Vol.519 (19), p.6354-6361 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
9 |
Material Type: Artigo
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Nitrogen vacancy, self-interstitial diffusion, and Frenkel-pair formation/dissociation in B1 TiN studied by ab initio and classical molecular dynamics with optimized potentialsSangiovanni, D G ; Alling, B ; Steneteg, P ; Hultman, L ; Abrikosov, I APhysical review. B, Condensed matter and materials physics, 2015-02, Vol.91 (5), p.054301 [Periódico revisado por pares]Texto completo disponível |
10 |
Material Type: Artigo
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Self-consistent modelling of X-ray photoelectron spectra from air-exposed polycrystalline TiN thin filmsGreczynski, G. ; Hultman, L.Applied surface science, 2016-11, Vol.387, p.294-300 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |