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Refinado por: Base de dados/Biblioteca: DOAJ Directory of Open Access Journals remover Base de dados/Biblioteca: HEAL-Link subscriptions: Institute of Physics (IOP) Journals remover Engineered Materials Abstracts remover
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1
Synthesis of potassium niobates by the microwave-assisted solvothermal method
Synthesis of potassium niobates by the microwave-assisted solvothermal method
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Synthesis of potassium niobates by the microwave-assisted solvothermal method

Duarte, T M ; Honorio, L M C ; Brito, A S ; Souza, J K D ; Longo, E ; Tranquilin, R L ; Souza, A G ; Santos, I M G ; Maia, A S

IOP conference series. Materials Science and Engineering, 2015-11, Vol.97 (1), p.12001 [Periódico revisado por pares]

Bristol: IOP Publishing

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2
Shear strain determination of the polymer polydimethysiloxane (PMDS) using digital image correlation in different temperatures
Shear strain determination of the polymer polydimethysiloxane (PMDS) using digital image correlation in different temperatures
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Shear strain determination of the polymer polydimethysiloxane (PMDS) using digital image correlation in different temperatures

de Oliveira, G N ; Nunes, L C S ; dos Santos, P A M

Journal of physics. Conference series, 2011-01, Vol.274 (1), p.012073-6 [Periódico revisado por pares]

Bristol: IOP Publishing

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3
Optical study of strained double Ge/Si quantum dot layers
Optical study of strained double Ge/Si quantum dot layers
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Optical study of strained double Ge/Si quantum dot layers

Santos, N M ; Falcão, B P ; Leitão, J P ; Sobolev, N A ; Carmo, M C ; Stepina, N S ; Yakimov, A ; Nikiforov, A I

IOP conference series. Materials Science and Engineering, 2009-11, Vol.6 (1), p.012018-012018 [Periódico revisado por pares]

Bristol: IOP Publishing

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4
Photoluminescence and Raman study of a tensilely strained Si type-II quantum well on a relaxed SiGe graded buffer
Photoluminescence and Raman study of a tensilely strained Si type-II quantum well on a relaxed SiGe graded buffer
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Photoluminescence and Raman study of a tensilely strained Si type-II quantum well on a relaxed SiGe graded buffer

Santos, N M ; Leitão, J P ; Sobolev, N A ; Correia, M R ; Carmo, M C ; Scares, M R ; Kasper, E ; Werner, J

IOP conference series. Materials Science and Engineering, 2009-11, Vol.6 (1), p.012023-012023 [Periódico revisado por pares]

Bristol: IOP Publishing

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