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Papers from the Eighth International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors
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Papers from the Eighth International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors

International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors (8th 2005 Daytona Beach, Fla.) Joseph Kopanski; American Vacuum Society

Journal of Vacuum Science & Technology B 2nd, ser., vol.24, n.1, 2006

New York Published by AVS through the American Institute of Physics 2006

Localização: IF - Instituto de Física    (J.Vac.Sci.Technol.B 24(1)2006 )(Acessar)

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Deste Autor:

  1. International Workshop on Fabrication, C
  2. Kopanski, J
  3. American Vacuum Society

Neste Assunto:

  1. Semiconductors
  2. Semiconductor Doping
  3. Semicondutores (Congressos)

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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