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1
Stabilizing the ferroelectric phase in doped hafnium oxide
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Stabilizing the ferroelectric phase in doped hafnium oxide

Hoffmann, M. ; Schroeder, U. ; Schenk, T. ; Shimizu, T. ; Funakubo, H. ; Sakata, O. ; Pohl, D. ; Drescher, M. ; Adelmann, C. ; Materlik, R. ; Kersch, A. ; Mikolajick, T.

Journal of applied physics, 2015-08, Vol.118 (7) [Periódico revisado por pares]

Melville: American Institute of Physics

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2
Effects of deposition conditions on the ferroelectric properties of (Al1−xScx)N thin films
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Effects of deposition conditions on the ferroelectric properties of (Al1−xScx)N thin films

Yasuoka, Shinnosuke ; Shimizu, Takao ; Tateyama, Akinori ; Uehara, Masato ; Yamada, Hiroshi ; Akiyama, Morito ; Hiranaga, Yoshiomi ; Cho, Yasuo ; Funakubo, Hiroshi

Journal of applied physics, 2020-09, Vol.128 (11) [Periódico revisado por pares]

Melville: American Institute of Physics

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3
Domain wall motion and electromechanical strain in lead-free piezoelectrics: Insight from the model system (1 − x)Ba(Zr0.2Ti0.8)O3–x(Ba0.7Ca0.3)TiO3 using in situ high-energy X-ray diffraction during application of electric fields
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Domain wall motion and electromechanical strain in lead-free piezoelectrics: Insight from the model system (1 − x)Ba(Zr0.2Ti0.8)O3–x(Ba0.7Ca0.3)TiO3 using in situ high-energy X-ray diffraction during application of electric fields

Tutuncu, Goknur ; Li, Binzhi ; Bowman, Keith ; Jones, Jacob L.

Journal of applied physics, 2014-04, Vol.115 (14) [Periódico revisado por pares]

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4
Effects of residual hydrogen in sputtering atmosphere on structures and properties of amorphous In-Ga-Zn-O thin films
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Effects of residual hydrogen in sputtering atmosphere on structures and properties of amorphous In-Ga-Zn-O thin films

Tang, Haochun ; Ishikawa, Kyohei ; Ide, Keisuke ; Hiramatsu, Hidenori ; Ueda, Shigenori ; Ohashi, Naoki ; Kumomi, Hideya ; Hosono, Hideo ; Kamiya, Toshio

Journal of applied physics, 2015-11, Vol.118 (20) [Periódico revisado por pares]

Melville: American Institute of Physics

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5
Numerical analysis of RF discharge in a nonuniform magnetic field
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Numerical analysis of RF discharge in a nonuniform magnetic field

Ma, Xiang ; Nishida, Hiroyuki ; Oshio, Yuya ; Furukawa, Takeru

Journal of applied physics, 2022-02, Vol.131 (8) [Periódico revisado por pares]

Melville: American Institute of Physics

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6
Hydrogen adsorption and anomalous electronic properties of nitrogen-doped graphene
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Hydrogen adsorption and anomalous electronic properties of nitrogen-doped graphene

Fujimoto, Yoshitaka ; Saito, Susumu

Journal of applied physics, 2014-04, Vol.115 (15) [Periódico revisado por pares]

Melville: American Institute of Physics

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7
Domain structures induced by tensile thermal strain in epitaxial PbTiO3 films on silicon substrates
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Domain structures induced by tensile thermal strain in epitaxial PbTiO3 films on silicon substrates

Sato, Tomoya ; Kodera, Masanori ; Ichinose, Daichi ; Mimura, Takanori ; Shimizu, Takao ; Yamada, Tomoaki ; Funakubo, Hiroshi

Journal of applied physics, 2022-01, Vol.131 (3) [Periódico revisado por pares]

Melville: American Institute of Physics

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8
A thermal spike model of grain growth under irradiation
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A thermal spike model of grain growth under irradiation

Kaoumi, D ; Motta, A T ; Birtcher, R C

Journal of applied physics, 2008-10, Vol.104 (7), p.073525-073525-13 [Periódico revisado por pares]

American Institute of Physics

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9
High temperature Seebeck coefficient metrology
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High temperature Seebeck coefficient metrology

Martin, J ; Tritt, T ; Uher, C

Journal of applied physics, 2010-12, Vol.108 (12), p.121101-121101-12 [Periódico revisado por pares]

American Institute of Physics

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10
Local C–V mapping for ferroelectrics using scanning nonlinear dielectric microscopy
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Local C–V mapping for ferroelectrics using scanning nonlinear dielectric microscopy

Hiranaga, Yoshiomi ; Mimura, Takanori ; Shimizu, Takao ; Funakubo, Hiroshi ; Cho, Yasuo

Journal of applied physics, 2020-12, Vol.128 (24) [Periódico revisado por pares]

Melville: American Institute of Physics

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