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Refinado por: assunto: Devices remover
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Electrical characteristics of a vertically integrated field-effect transistor using non-intentionally doped Si nanowires
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Electrical characteristics of a vertically integrated field-effect transistor using non-intentionally doped Si nanowires

Rosaz, G. ; Salem, B. ; Pauc, N. ; Gentile, P. ; Potié, A. ; Baron, T.

Microelectronic engineering, 2011-11, Vol.88 (11), p.3312-3315 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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The effect of device fabrication on quasi-static elastic behaviour of silicon nanocantilever arrays
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The effect of device fabrication on quasi-static elastic behaviour of silicon nanocantilever arrays

Gleeson, Peter ; Lin, Kevin ; Potie, Alexis ; Pawashe, Chytra ; P de Silva, Johann ; Cross, Graham L W ; Boland, John J

Journal of micromechanics and microengineering, 2015-12, Vol.25 (12), p.125007-7 [Periódico revisado por pares]

IOP Publishing

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Adhesion Limits and Design Criteria for Nanorelays
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Adhesion Limits and Design Criteria for Nanorelays

Lin, Kevin L. ; Cross, Graham L. W. ; Gleeson, Peter ; de Silva, Johann P. ; Levander, Alejandro ; Munoz, Jorge A. ; Pawashe, Chytra ; Potie, Alexis ; Theofanis, Patrick ; Boland, John J. ; Kuhn, Kelin J.

IEEE transactions on electron devices, 2016-01, Vol.63 (1), p.465-470 [Periódico revisado por pares]

New York: IEEE

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