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Material Type: Artigo
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Electrical characteristics of a vertically integrated field-effect transistor using non-intentionally doped Si nanowiresRosaz, G. ; Salem, B. ; Pauc, N. ; Gentile, P. ; Potié, A. ; Baron, T.Microelectronic engineering, 2011-11, Vol.88 (11), p.3312-3315 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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Material Type: Artigo
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The effect of device fabrication on quasi-static elastic behaviour of silicon nanocantilever arraysGleeson, Peter ; Lin, Kevin ; Potie, Alexis ; Pawashe, Chytra ; P de Silva, Johann ; Cross, Graham L W ; Boland, John JJournal of micromechanics and microengineering, 2015-12, Vol.25 (12), p.125007-7 [Periódico revisado por pares]IOP PublishingTexto completo disponível |
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Material Type: Artigo
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Adhesion Limits and Design Criteria for NanorelaysLin, Kevin L. ; Cross, Graham L. W. ; Gleeson, Peter ; de Silva, Johann P. ; Levander, Alejandro ; Munoz, Jorge A. ; Pawashe, Chytra ; Potie, Alexis ; Theofanis, Patrick ; Boland, John J. ; Kuhn, Kelin J.IEEE transactions on electron devices, 2016-01, Vol.63 (1), p.465-470 [Periódico revisado por pares]New York: IEEETexto completo disponível |