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Growth and characterization of gold catalyzed SiGe nanowires and alternative metal-catalyzed Si nanowires
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Growth and characterization of gold catalyzed SiGe nanowires and alternative metal-catalyzed Si nanowires

Potié, Alexis ; Baron, Thierry ; Dhalluin, Florian ; Rosaz, Guillaume ; Salem, Bassem ; Latu-Romain, Laurence ; Kogelschatz, Martin ; Gentile, Pascal ; Oehler, Fabrice ; Montès, Laurent ; Kreisel, Jens ; Roussel, Hervé

Nanoscale research letters, 2011-03, Vol.6 (1), p.187-187, Article 187 [Periódico revisado por pares]

New York: Springer New York

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Controlled growth of SiGe nanowires by addition of HCl in the gas phase
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Controlled growth of SiGe nanowires by addition of HCl in the gas phase

Potié, Alexis ; Baron, Thierry ; Latu-Romain, Laurence ; Rosaz, Guillaume ; Salem, Bassem ; Montès, Laurent ; Gentile, Pascal ; Kreisel, Jens ; Roussel, Hervé

Journal of applied physics, 2011-07, Vol.110 (2), p.024311-024311-8 [Periódico revisado por pares]

American Institute of Physics

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Vertically integrated silicon-germanium nanowire field-effect transistor
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Vertically integrated silicon-germanium nanowire field-effect transistor

Rosaz, G. ; Salem, B. ; Pauc, N. ; Potié, A. ; Gentile, P. ; Baron, T.

Applied physics letters, 2011-11, Vol.99 (19), p.193107-193107-3 [Periódico revisado por pares]

American Institute of Physics

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Electrical characteristics of a vertically integrated field-effect transistor using non-intentionally doped Si nanowires
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Electrical characteristics of a vertically integrated field-effect transistor using non-intentionally doped Si nanowires

Rosaz, G. ; Salem, B. ; Pauc, N. ; Gentile, P. ; Potié, A. ; Baron, T.

Microelectronic engineering, 2011-11, Vol.88 (11), p.3312-3315 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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ELECTRICAL CHARACTERIZATION OF PLANAR SILICON NANOWIRE FIELD-EFFECT TRANSISTORS
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ELECTRICAL CHARACTERIZATION OF PLANAR SILICON NANOWIRE FIELD-EFFECT TRANSISTORS

ROSAZ, G ; SALEM, B ; PAUC, N ; GENTILE, P ; POTIÉ, A ; SOLANKI, A ; BASSANI, F ; BARON, T ; CAGNON, L

International journal of nanoscience, 2012-08, Vol.11 (4), p.1240011-1240015 [Periódico revisado por pares]

World Scientific Publishing Company

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