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Atomic oxygen radical observation in an atmospheric pressure pulsed discharge by TALIF
Atomic oxygen radical observation in an atmospheric pressure pulsed discharge by TALIF
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Atomic oxygen radical observation in an atmospheric pressure pulsed discharge by TALIF

Takezawa, K. ; Ono, R. ; Oda, T.

Fourtieth IAS Annual Meeting. Conference Record of the 2005 Industry Applications Conference, 2005, 2005, Vol.4, p.2914-2917 Vol. 4

IEEE

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Charge storage in a corona-charged polypropylene film analyzed by LIPP and TSC method
Charge storage in a corona-charged polypropylene film analyzed by LIPP and TSC method
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Charge storage in a corona-charged polypropylene film analyzed by LIPP and TSC method

Ono, R. ; Oda, T.

Conference Record of the 2002 IEEE Industry Applications Conference. 37th IAS Annual Meeting (Cat. No.02CH37344), 2002, Vol.1, p.585-588 vol.1

IEEE

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3
Scrubber-induced substrate cracks found by data mining analysis
Scrubber-induced substrate cracks found by data mining analysis
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Scrubber-induced substrate cracks found by data mining analysis

Hirano, Y. ; Shindo, W. ; Ono, R. ; Kitou, M. ; Yamaura, T. ; Satou, F. ; Imaoka, K.

ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005, 2005, p.257-259

IEEE

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4
Measurement of OH radical in the effluent of an atmospheric-pressure helium plasma jet
Measurement of OH radical in the effluent of an atmospheric-pressure helium plasma jet
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Measurement of OH radical in the effluent of an atmospheric-pressure helium plasma jet

Yonemori, S. ; Ono, R. ; Oda, T.

2012 IEEE Industry Applications Society Annual Meeting, 2012, p.1-4

IEEE

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5
Investigation of humidity effect on atmospheric plasma decomposition of toxic gas with direct optical measurement of OH radicals
Investigation of humidity effect on atmospheric plasma decomposition of toxic gas with direct optical measurement of OH radicals
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Investigation of humidity effect on atmospheric plasma decomposition of toxic gas with direct optical measurement of OH radicals

Nakagawa, Y. ; Ono, R. ; Oda, T.

2012 IEEE Industry Applications Society Annual Meeting, 2012, p.1-4

IEEE

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6
Measurements and modeling of microwave impedance of High-Tc grain boundaries
Measurements and modeling of microwave impedance of High-Tc grain boundaries
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Measurements and modeling of microwave impedance of High-Tc grain boundaries

OATES, D. E ; HABIB, Y. M ; LEHNER, C. J ; VALE, L. R ; ONO, R. H ; DRESSELHAUS, G ; DRESSELHAUS, M. S

IEEE transactions on applied superconductivity, 1999, Vol.9 (2), p.2446-2451 [Periódico revisado por pares]

New York, NY: Institute of Electrical and Electronics Engineers

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7
Two-dimensional simulation of streamer discharge including the vibrationally excited molecules effects
Two-dimensional simulation of streamer discharge including the vibrationally excited molecules effects
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Two-dimensional simulation of streamer discharge including the vibrationally excited molecules effects

Komuro, A. ; Ono, R. ; Oda, T.

2011 IEEE Industry Applications Society Annual Meeting, 2011, p.1-6

IEEE

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8
The Low Voltage Electrostatic Discharge on the Contacting Point
The Low Voltage Electrostatic Discharge on the Contacting Point
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The Low Voltage Electrostatic Discharge on the Contacting Point

Oda, T. ; Miyasaka, H. ; Ono, Y. ; Ono, R.

2009 IEEE Industry Applications Society Annual Meeting, 2009, p.1-6

IEEE

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9
Low Voltage Contact Electrostatic Discharge Phenomena
Low Voltage Contact Electrostatic Discharge Phenomena
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Low Voltage Contact Electrostatic Discharge Phenomena

Oda, T ; Hanawa, K ; Teramoto, Y ; Ono, R

2010 IEEE Industry Applications Society Annual Meeting, 2010, p.1-5

IEEE

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10
Measurement of hydroxyl radicals in an atmospheric pressure discharge plasma by using laser-induced fluorescence
Measurement of hydroxyl radicals in an atmospheric pressure discharge plasma by using laser-induced fluorescence
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Measurement of hydroxyl radicals in an atmospheric pressure discharge plasma by using laser-induced fluorescence

Ono, R. ; Oda, T.

Conference Record of 1998 IEEE Industry Applications Conference. Thirty-Third IAS Annual Meeting (Cat. No.98CH36242), 1998, Vol.3, p.1777-1783 vol.3

IEEE

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