Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: magazinearticle
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The Coolest Gas in the UniverseCollins, Graham PScientific American, 2000-12, Vol.283 (6), p.92-99United States: Scientific American, IncorporatedTexto completo disponível |
2 |
Material Type: magazinearticle
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Particle Accelerators Test Cosmological TheorySchramm, David N. ; Steigman, GaryScientific American, 1988-06, Vol.258 (6), p.66-73New York: Scientific American, IncorporatedTexto completo disponível |
3 |
Material Type: magazinearticle
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Supergravity and the Unification of the Laws of PhysicsFreedman, Daniel Z. ; van Nieuwenhuizen, PeterSci. Am.; (United States), 1978-02, Vol.238 (2), p.126-143United StatesTexto completo disponível |
4 |
Material Type: magazinearticle
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Plasma etch challenges for FinFET transistorsKanarik, Keren J ; Kamarthy, Gowri ; Gottscho, Richard ASolid state technology, 2012-04, Vol.55 (3), p.15-26Tulsa: PennWell CorporationSem texto completo |
5 |
Material Type: magazinearticle
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MEASURING BeautyWilkinson, GuyScientific American, 2017-10, Vol.317 (5), p.56-63United States: Scientific American, a division of Nature America, IncTexto completo disponível |
6 |
Material Type: magazinearticle
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When Particles Break the RulesCrivellin, AndreasScientific American, 2022-11, Vol.327 (5), p.66New York: Scientific American, IncorporatedTexto completo disponível |
7 |
Material Type: magazinearticle
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Wet-etch process improvements through SPCTAYLOR, D. SSolid state technology, 1998-07, Vol.41 (7), p.119-129Tulsa, OK: PennWellTexto completo disponível |
8 |
Material Type: magazinearticle
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Low-Energy Ways to Observe High-Energy PhenomenaCline, David B.Scientific American, 1994-09, Vol.271 (3), p.40-47New York, NY: Scientific AmericanTexto completo disponível |
9 |
Material Type: magazinearticle
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The Optics of Long-Wavelength X RaysSpiller, Eberhard ; Feder, RalphSci. Am.; (United States), 1978-11, Vol.239 (5), p.70-79United StatesTexto completo disponível |
10 |
Material Type: magazinearticle
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Etching new IC materials for memory devicesDEORNELLAS, S. P ; COFER, ASolid state technology, 1998-08, Vol.41 (8), p.53-58Tulsa, OK: PennWellTexto completo disponível |