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1
Local structure and bonds of amorphous silicon oxynitride thin films
Local structure and bonds of amorphous silicon oxynitride thin films
Material Type:
Artigo 		Adicionar ao Meu Espaço

Local structure and bonds of amorphous silicon oxynitride thin films

Wanderla Luis Scopel Márcia Carvalho de Abreu Fantini; Marco Isaías Alayo Chávez 1971-; Inés Pereyra 1947-

Thin Solid Films Lausanne v. 413, n. 1-2, p. 59-64, 2002

Lausanne 2002

Acesso online

2
Local structure and bonds of amorphous silicon oxynitride thin films
Local structure and bonds of amorphous silicon oxynitride thin films
Material Type:
Artigo 		Adicionar ao Meu Espaço

Local structure and bonds of amorphous silicon oxynitride thin films

Wanderla Luis Scopel Márcia Carvalho de Abreu Fantini; Marco Isaías Alayo Chávez 1971-; Inés Pereyra 1947-

Thin Solid Films Lausanne v. 413, n. 1-2, p. 59-64, 2002

Lausanne 2002

Acesso online

3
Mechanical and thermophysical properties of PECVD oxynitride films measured by mems
Mechanical and thermophysical properties of PECVD oxynitride films measured by mems
Material Type:
Artigo 		Adicionar ao Meu Espaço

Mechanical and thermophysical properties of PECVD oxynitride films measured by mems

Marcelo Silva Guimarães Amilton Sinatora 1951-; M. I Aloyo; Inés Pereyra 1947-; Marcelo Nelson Páez Carreño 1962-

Thin Solid Films Lausanne v. 398-399, p. 626-631, nov. 2001

Lausanne 2001

Acesso online

4
On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films
On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films
Material Type:
Artigo 		Adicionar ao Meu Espaço

On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films

Marco Isaías Alayo Chávez 1971- Inés Pereyra 1947-; Wanderla Luis Scopel; Márcia Carvalho de Abreu Fantini

Thin Solid Films Lausanne v. 402, n. 1-2, p. 154-161, 2002

Lausanne 2002

Acesso online

5
Mechanical and thermophysical properties of PECVD oxynitride films measured by mems
Mechanical and thermophysical properties of PECVD oxynitride films measured by mems
Material Type:
Artigo 		Adicionar ao Meu Espaço

Mechanical and thermophysical properties of PECVD oxynitride films measured by mems

Marcelo Silva Guimarães Amilton Sinatora 1951-; M. I Aloyo; Inés Pereyra 1947-; Marcelo Nelson Páez Carreño 1962-

Thin Solid Films Lausanne v. 398-399, p. 626-631, nov. 2001

Lausanne 2001

Acesso online

6
On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films
On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films
Material Type:
Artigo 		Adicionar ao Meu Espaço

On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films

Marco Isaías Alayo Chávez 1971- Inés Pereyra 1947-; Wanderla Luis Scopel; Márcia Carvalho de Abreu Fantini

Thin Solid Films Lausanne v. 402, n. 1-2, p. 154-161, 2002

Lausanne 2002

Acesso online

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