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| Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
|---|---|---|---|
| 1 |
Material Type: Artigo
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Predictions of weld pool profiles using plasma physicsTanaka, M ; Lowke, J JJournal of physics. D, Applied physics, 2007-01, Vol.40 (1), p.R1-R23 [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |
| 2 |
Material Type: Artigo
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Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturingShinoda, K ; Miyoshi, N ; Kobayashi, H ; Miura, M ; Kurihara, M ; Maeda, K ; Negishi, N ; Sonoda, Y ; Tanaka, M ; Yasui, N ; Izawa, M ; Ishii, Y ; Okuma, K ; Saldana, T ; Manos, J ; Ishikawa, K ; Hori, MJournal of physics. D, Applied physics, 2017-04, Vol.50 (19), p.194001 [Periódico revisado por pares]IOP PublishingTexto completo disponível |
| 3 |
Material Type: Artigo
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A computational investigation of the effectiveness of different shielding gas mixtures for arc weldingMurphy, A B ; Tanaka, M ; Tashiro, S ; Sato, T ; Lowke, J JJournal of physics. D, Applied physics, 2009-06, Vol.42 (11), p.115205-115205 (14) [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |
| 4 |
Material Type: Artigo
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Residual stress measurement of an EB-PVD Y2O3-ZrO2 thermal barrier coating by micro-Raman spectroscopyTANAKA, M ; KITAZAWA, R ; TOMIMATSU, T ; LIU, Y. F ; KAGAWA, YSurface & coatings technology, 2009-12, Vol.204 (5), p.657-660 [Periódico revisado por pares]Amsterdam: ElsevierTexto completo disponível |
| 5 |
Material Type: Artigo
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Structure oriented compact model for advanced trench IGBTs without fitting parameters for extreme condition: Part ITanaka, M. ; Omura, I.Microelectronics and reliability, 2011-09, Vol.51 (9-11), p.1933-1937 [Periódico revisado por pares]Kidlington: Elsevier LtdTexto completo disponível |
| 6 |
Material Type: Artigo
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Numerical simulation of metal vapor behavior in arc plasmaYamamoto, K. ; Tanaka, M. ; Tashiro, S. ; Nakata, K. ; Yamazaki, K. ; Yamamoto, E. ; Suzuki, K. ; Murphy, A.B.Surface & coatings technology, 2008-08, Vol.202 (22-23), p.5302-5305 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
| 7 |
Material Type: Artigo
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Characteristics of ionized gas metal arc processingTanaka, M. ; Tamaki, T. ; Tashiro, S. ; Nakata, K. ; Ohnawa, T. ; Ueyama, T.Surface & coatings technology, 2008-08, Vol.202 (22-23), p.5251-5254 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
| 8 |
Material Type: Artigo
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Simulation analysis of triboplasma generation using the particle-in-cell/Monte Carlo collision (PIC/MCC) methodNakayama, Keiji ; Tanaka, MasaakiJournal of physics. D, Applied physics, 2012-12, Vol.45 (49), p.495203-1-8 [Periódico revisado por pares]IOP PublishingTexto completo disponível |
| 9 |
Material Type: Artigo
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Ferromagnetic semiconductor heterostructures based on (GaMn)AsTanaka, M. ; Shimizu, H. ; Hayashi, T. ; Shimada, H. ; Ando, K.Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2000-07, Vol.18 (4), p.1247-1253 [Periódico revisado por pares]Texto completo disponível |
| 10 |
Material Type: Artigo
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High-quality SiO2 film deposition using active reaction by oxygen radicalKUMAGAI, A ; ISHIBASHI, K ; XU, Ge ; TANAKA, M ; NOGAMI, H ; OKADA, OVacuum, 2002-08, Vol.66 (3-4), p.317-322 [Periódico revisado por pares]Oxford: ElsevierTexto completo disponível |
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