Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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(0?0?1) Co^sub 2^Z filled random Co^sub 2^Z powder: A lightweight and broadband with enhanced electromagnetic wave absorption propertiesYang, Haibo ; Dai, Jingjing ; Liu, Xiao ; Lin, Ying ; Wang, FenMaterials letters, 2018-02, Vol.212, p.275 [Periódico revisado por pares]Amsterdam: Elsevier BVTexto completo disponível |
2 |
Material Type: Artigo
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(006)-oriented α-Al2O3 films prepared in CO2–H2 atmosphere by laser chemical vapor deposition using a diode laserYou, Yu ; Ito, Akihiko ; Tu, Rong ; Goto, TakashiMaterials science & engineering. B, Solid-state materials for advanced technology, 2011-08, Vol.176 (13), p.984-989 [Periódico revisado por pares]Texto completo disponível |
3 |
Material Type: Artigo
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0.1–10-keV x-ray-induced electron emissions from solids—Models and secondary electron measurementsHenke, Burton L. ; Smith, Jerel A. ; Attwood, David T.Journal of applied physics, 1977-05, Vol.48 (5), p.1852-1866 [Periódico revisado por pares]Texto completo disponível |
4 |
Material Type: Artigo
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0.1-10 MeV Neutron Soft Error Rate in Accelerator and Atmospheric EnvironmentsCecchetto, Matteo ; Alia, Ruben Garcia ; Wrobel, Frederic ; Coronetti, Andrea ; Bilko, Kacper ; Lucsanyi, David ; Fiore, Salvatore ; Bazzano, Giulia ; Pirovano, Elisa ; Nolte, RalfIEEE transactions on nuclear science, 2021-05, Vol.68 (5), p.873-883 [Periódico revisado por pares]New York: IEEETexto completo disponível |
5 |
Material Type: Artigo
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0.1-mu m Gate-length pseudomorphic HEMT' sChao, P C ; Tiberio, R C ; Duh, K-H G ; Smith, P M ; Ballingall, J M ; Lester, L F ; Lee, B R ; Jabra, A ; Gifford, G GIEEE electron device letters, 1987-10, Vol.8 (10), p.489-491 [Periódico revisado por pares]Texto completo disponível |
6 |
Material Type: Artigo
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0.1-mu m T-gate Al-free InP/InGaAs/InP pHEMTs for W-bandapplications using a nitrogen carrier for LP-MOCVD growthSchimpf, K ; Sommer, M ; Horstmann, M ; Hollfelder, M ; van der Hart, A ; Marso, M ; Kordos, P ; Luth, HIEEE electron device letters, 1997-04, Vol.18 (4), p.144-146 [Periódico revisado por pares]Texto completo disponível |
7 |
Material Type: Artigo
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0.12-μm gate III-V nitride HFET's with high contact resistancesBurm, J. ; Chu, K. ; Schaff, W.J. ; Eastman, L.F. ; Khan, M.A. ; Qisheng Chen ; Yang, J.W. ; Shur, M.S.IEEE electron device letters, 1997-04, Vol.18 (4), p.141-143 [Periódico revisado por pares]IEEETexto completo disponível |
8 |
Material Type: Artigo
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0.13-mu m 32-Mb/64-Mb embedded DRAM core with high efficientredundancy and enhanced testabilityKikukawa, H ; Tomishima, S ; Tsuji, T ; Kawasaki, T ; Sakamoto, S ; Ishikawa, M ; Abe, W ; Tanizaki, H ; Kato, H ; Uchikoba, T ; Inokuchi, T ; Senoh, M ; Fukushima, Y ; Nirro, M ; Maruta, M ; Shibayama, A ; Ooishi, T ; Takahashi, K ; Hidaka, HIEEE journal of solid-state circuits, 2002-07, Vol.37 (7), p.932-940 [Periódico revisado por pares]Texto completo disponível |
9 |
Material Type: Artigo
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0.15 mu m passivated InP-based HEMT MMIC technology with highthermal stability in hydrogen ambientChertouk, M ; Dammann, M ; Kohler, K ; Weimann, GIEEE electron device letters, 2000-03, Vol.21 (3), p.97-99 [Periódico revisado por pares]Texto completo disponível |
10 |
Material Type: Artigo
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0.18 mum CMOS programmable frequency divider design for DVB-THu, Qingsheng ; Zhong, Jianfeng ; He, XiaohuDong nan da xue xue bao, 2008-06, Vol.24 (2), p.159-162Sem texto completo |