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Single layer chemically amplified resist processes for device fabrication by x‐ray lithography
Single layer chemically amplified resist processes for device fabrication by x‐ray lithography
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Single layer chemically amplified resist processes for device fabrication by x‐ray lithography

Seeger, D. ; Viswanathan, R. ; Blair, C. ; Gelorme, J. ; Conley, W.

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992, Vol.10 (6), p.2620-2627

WOODBURY: Amer Inst Physics

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2
Plasma enhanced chemical vapor deposition silicon oxides as studied by x‐ray photoelectron spectroscopy, Rutherford backscattering, electron recoil detection analysis, infrared spectroscopy, and electron spin resonance
Plasma enhanced chemical vapor deposition silicon oxides as studied by x‐ray photoelectron spectroscopy, Rutherford backscattering, electron recoil detection analysis, infrared spectroscopy, and electron spin resonance
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Plasma enhanced chemical vapor deposition silicon oxides as studied by x‐ray photoelectron spectroscopy, Rutherford backscattering, electron recoil detection analysis, infrared spectroscopy, and electron spin resonance

Sindzingre, T. ; Ermolieff, A. ; Marthon, S. ; Martin, P. ; Pierre, F. ; Peccoud, L.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1993, Vol.11 (4), p.1851-1857 [Periódico revisado por pares]

Melville, NY: American Institute of Physics

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3
Radio‐frequency ion sources for space propulsion (invited)
Radio‐frequency ion sources for space propulsion (invited)
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Radio‐frequency ion sources for space propulsion (invited)

Groh, K. H. ; Loeb, H. W.

Review of Scientific Instruments, 1992, Vol.63 (4), p.2513-2518 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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4
Adsorption and decomposition of 2‐chloroethyl ethyl sulfide on Pt(111): A temperature programmed desorption and laser‐induced thermal desorption/Fourier transform mass spectrometry study
Adsorption and decomposition of 2‐chloroethyl ethyl sulfide on Pt(111): A temperature programmed desorption and laser‐induced thermal desorption/Fourier transform mass spectrometry study
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Adsorption and decomposition of 2‐chloroethyl ethyl sulfide on Pt(111): A temperature programmed desorption and laser‐induced thermal desorption/Fourier transform mass spectrometry study

Zhou, X.‐L. ; Sun, Z.‐J. ; White, J. M.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1993, Vol.11 (4), p.2110-2116 [Periódico revisado por pares]

Melville, NY: American Institute of Physics

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