Effect of Ti/Si and Ti/TiN/Si interlayers on the structure, properties, and tribological behavior of an a-C film deposited onto a C17200 copper-beryllium alloy
Miguel D. Santos Newton Kiyoshi Fukumasu; André Paulo Tschiptschin 1948-; Nelson Batista de Lima; Carlos A Figueroa; Jennifer Stefani Weber; Roberto Martins de Souza 1966-; Izabel Fernanda Machado 1970-