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Refinado por: autor: Mansano, R remover
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1
Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom)
Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom)
Material Type:
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Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom)

Marcos Massi Ronaldo Domingues Mansano 1964-; Homero Santiago Maciel; Patrick Bernard Verdonck 1958-; Conference of the Brazilian Microelectronics Society (12. 1997 Caxambu)

Proceedings Itajubá : SBMICRO/EFEI, 1997

Itajubá SBMICRO/EFEI 1997

Item não circula. Consulte sua biblioteca.(Acessar)

2
Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering
Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering
Material Type:
Relatório Técnico 		Adicionar ao Meu Espaço

Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering

Marcos Massi Ronaldo Domingues Mansano 1964-; Homero Santiago Maciel; C Otani; Patrick Bernard Verdonck 1958-; L. N. B. M Nishioka

São Paulo EPUSP 1999

Item não circula. Consulte sua biblioteca.(Acessar)

3
Comparison between single and double Langmuir probe tecniques for analysis of inductively coupled plasmas
Comparison between single and double Langmuir probe tecniques for analysis of inductively coupled plasmas
Material Type:
Relatório Técnico 		Adicionar ao Meu Espaço

Comparison between single and double Langmuir probe tecniques for analysis of inductively coupled plasmas

Giuseppe Antonio Cirino Patrick Bernard Verdonck 1958-; Homero Santiago Maciel; R M Castro; Marcos Massi; M B Pisani; Ronaldo Domingues Mansano 1964-

São Paulo EPUSP 1998

Item não circula. Consulte sua biblioteca.(Acessar)

4
The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering
The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering
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The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering

Ronaldo Domingues Mansano 1964- Ana Paula Mousinho; Luís da Silva Zambom; Marina Sparvoli de Medeiros; Patrick Bernard Verdonck 1958-; M Guerino; Marcos Massi; International Symposium on Microelectronics Technology and Devices SBMICRO (19. 2004 Porto de Galinhas)

Santos, E. J. B.; Ribas, R. P.; Swart, J. eds Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03 Pennington : The Electrochemical Society, 2004

Pennington The Electrochemical Society 2004

Item não circula. Consulte sua biblioteca.(Acessar)

5
Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films
Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films
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Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films

Ronaldo Domingues Mansano 1964- Paula Maria Nogueira; Luís da Silva Zambom; Patrick Bernard Verdonck 1958-; Marcos Massi; Homero Santiago Maciel; International Conference on Microelectronics and Packaging (14. 1999 Campinas)

ICMP 99: technical digest São Paulo : SBMicro/IMAPS, 1999

São Paulo SBMicro/IMAPS 1999

Item não circula. Consulte sua biblioteca.(Acessar)

6
The applicability of Langmuir probes for end point detection of polymer etching
The applicability of Langmuir probes for end point detection of polymer etching
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The applicability of Langmuir probes for end point detection of polymer etching

Ronaldo Domingues Mansano 1964- Paula Maria Nogueira; Luís da Silva Zambom; Patrick Bernard Verdonck 1958-; Marcos Massi; Homero Santiago Maciel; International Conference on Microelectronics and Packaging (14. 1999 Campinas)

ICMP 99: technical digest São Paulo : SBMicro/IMAPS, 1999

São Paulo SBMicro/IMAPS 1999

Item não circula. Consulte sua biblioteca.(Acessar)

7
Use of diamond-like carbon with tungsten (W-DLC) films for orthopedics implants
Use of diamond-like carbon with tungsten (W-DLC) films for orthopedics implants
Material Type:
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Use of diamond-like carbon with tungsten (W-DLC) films for orthopedics implants

Luís Henrique Garcia-Amoedo Terezinha de Jesus Andreoli Pinto; Luís da Silva Zambom; Ana Paula Mousinho; Ronaldo Domingues Mansano 1964-; Marcos Massi; Ronaldo Ruas; Encontro da Sociedade Brasileira de Pesquisas em Materiais (5 2006 Florianópolis, SC); Brazilian MRS Meeting (5 2006 Florianópolis, SC)

Final Program Rio de Janeiro : SBPMat, 2006

Rio de Janeiro SBPMat 2006

Item não circula. Consulte sua biblioteca.(Acessar)

8
Electrical and structural characterization of DLC films deposited by magnetron sputtering
Electrical and structural characterization of DLC films deposited by magnetron sputtering
Material Type:
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Electrical and structural characterization of DLC films deposited by magnetron sputtering

Marcos Massi Homero Santiago Maciel; C Otani; Ronaldo Domingues Mansano 1964-; Patrick Bernard Verdonck 1958-

Journal of Materials Science: Materials in Electronics London : Kluwer Academic, 2001 v. 12, p. 343-346, 2001

London 2001

Item não circula. Consulte sua biblioteca.(Acessar)

9
The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films
The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films
Material Type:
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The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films

M. Guerino Marcos Massi; Homero Santiago Maciel; C Otani; Ronaldo Domingues Mansano 1964-

Microelectronics Journal Luton : Mackintosh, 2003 v. 34, n. 5-8, May/Aug. 2003

Luton 2003

Item não circula. Consulte sua biblioteca.(Acessar)

10
High density plasma chemical vapor deposition of diamond-like carbon films
High density plasma chemical vapor deposition of diamond-like carbon films
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High density plasma chemical vapor deposition of diamond-like carbon films

Ana Paula Mousinho Ronaldo Domingues Mansano 1964-; Marcos Massi; Luís da Silva Zambom

Microelectronics Journal Luton v. 34, n. 5-8, p. 627-629, May/Aug. 2003

Luton 2003

Item não circula. Consulte sua biblioteca.(Acessar)

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Deste Autor:

  1. Massi, M
  2. Mansano, R
  3. Maciel, H
  4. Verdonck, P
  5. Otani, C

Neste Assunto:

  1. Plasma (Microeletrônica)
  2. Filmes Finos
  3. Filmes
  4. Circuitos Integrados
  5. Semicondutores

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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