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Silicon surface roughness induced by SF6-based reactive ion etching process for micromachining applications
Silicon surface roughness induced by SF6-based reactive ion etching process for micromachining applications
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Silicon surface roughness induced by SF6-based reactive ion etching process for micromachining applications

Patrick Bernard Verdonck 1958- Ronaldo Domingues Mansano 1964-; Homero Santiago Maciel; Maria Cecília Barbosa da Silveira Salvadori

Journal of Solid-State Devices and Circuits São Paulo v. 6, n. 1, p. 1-6, 1998

São Paulo 1998

Item não circula. Consulte sua biblioteca.(Acessar)

2
Silicon surface roughness induced by SF6-based reactive ion etching process for micromachining applications
Silicon surface roughness induced by SF6-based reactive ion etching process for micromachining applications
Material Type:
Artigo 		Adicionar ao Meu Espaço

Silicon surface roughness induced by SF6-based reactive ion etching process for micromachining applications

Patrick Bernard Verdonck 1958- Ronaldo Domingues Mansano 1964-; Homero Santiago Maciel; Maria Cecília Barbosa da Silveira Salvadori

Journal of Solid-State Devices and Circuits São Paulo v. 6, n. 1, p. 1-6, 1998

São Paulo 1998

Item não circula. Consulte sua biblioteca.(Acessar)

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Deste Autor:

  1. Salvadori, M
  2. Mansano, R
  3. Verdonck, P
  4. Maciel, H

Neste Assunto:

  1. Circuitos Integrados

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

Buscando em bases de dados remotas. Favor aguardar.