Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
---|---|---|---|
1 |
Material Type: Artigo
|
![]() |
Self-Assembled Monolayers of Alkylphosphonic Acid on GaN SubstratesIto, Takashi ; Forman, Sarah M ; Cao, Chundi ; Li, Feng ; Eddy, Charles R ; Mastro, Michael A ; Holm, Ronald T ; Henry, Richard L ; Hohn, Keith L ; Edgar, J. HLangmuir, 2008-07, Vol.24 (13), p.6630-6635 [Periódico revisado por pares]Washington, DC: American Chemical SocietyTexto completo disponível |
2 |
Material Type: Artigo
|
![]() |
Etch rates near hot-wall CVD growth temperature for Si-face 4H-SiC using H2 and C3H8VANMIL, B. L ; LEW, K.-K ; MYERS-WARD, R. L ; HOLM, R. T ; GASKILL, D. K ; EDDY, C. R ; WANG, L ; ZHAO, PJournal of crystal growth, 2009, Vol.311 (2), p.238-243 [Periódico revisado por pares]Amsterdam: ElsevierTexto completo disponível |
3 |
Material Type: Artigo
|
![]() |
Investigation of three-step epilayer growth approach of GaN films to minimize compensationEDDY, C. R ; HOLM, R. T ; HENRY, R. L ; CULBERTSON, J. C ; TWIGG, M. EJournal of electronic materials, 2005-09, Vol.34 (9), p.1187-1192 [Periódico revisado por pares]New York, NY: Institute of Electrical and Electronics EngineersTexto completo disponível |
4 |
Material Type: Artigo
|
![]() |
MOCVD growth of thick AlN and AlGaN superlattice structures on Si substratesMastro, M.A. ; Eddy, C.R. ; Gaskill, D.K. ; Bassim, N.D. ; Casey, J. ; Rosenberg, A. ; Holm, R.T. ; Henry, R.L. ; Twigg, M.E.Journal of crystal growth, 2006-01, Vol.287 (2), p.610-614 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
5 |
Material Type: Artigo
|
![]() |
Diffraction Contrast of Threading Dislocations in GaN and 4H-SiC Epitaxial Layers Using Electron Channeling Contrast ImagingTwigg, M. E. ; Picard, Y. N. ; Caldwell, J. D. ; Eddy, C. R. ; Mastro, M. A. ; Holm, R. T. ; Neudeck, P. G. ; Trunek, A. J. ; Powell, J. A.Journal of electronic materials, 2010-06, Vol.39 (6), p.743-746 [Periódico revisado por pares]Boston: Springer USTexto completo disponível |
6 |
Material Type: Artigo
|
![]() |
Characteristics of in situ Mg-doped GaN epilayers subjected to ultra-high-temperature microwave annealing using protective capsSundaresan, Siddarth G ; Murthy, Madhu ; Rao, Mulpuri V ; Schreifels, John A ; Mastro, M A ; Eddy, Charles R ; Holm, R T ; Henry, R L ; Freitas, Jaime A ; Gomar-Nadal, Elba ; Vispute, R D ; Tian, Yong-LaiSemiconductor science and technology, 2007-10, Vol.22 (10), p.1151-1156 [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |
7 |
Material Type: Artigo
|
![]() |
Experimental study of plasmonically enhanced GaN nanowire light emittersMastro, Michael A. ; Freitas Jr, Jaime A. ; Twigg, Mark ; Holm, R. T. ; Eddy Jr, Charles R. ; Kub, Fritz ; Kim, Hong-Yeol ; Ahn, Jaehui ; Kim, JihyunPhysica status solidi. A, Applications and materials science, 2008-02, Vol.205 (2), p.378-382 [Periódico revisado por pares]Berlin: WILEY-VCH VerlagTexto completo disponível |
8 |
Material Type: Artigo
|
![]() |
Rare-earth chloride seeded growth of GaN nano- and micro-crystalsMastro, M.A. ; Freitas, J.A. ; Holm, R.T. ; Eddy, C.R. ; Caldwell, J. ; Liu, K. ; Glembocki, O. ; Henry, R.L. ; Kim, J.Applied surface science, 2007-05, Vol.253 (14), p.6157-6161 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
9 |
Material Type: Artigo
|
![]() |
Real loci of symplectic reductionsGoldin, R. F. ; Holm, T. S.Transactions of the American Mathematical Society, 2004-11, Vol.356 (11), p.4623-4642 [Periódico revisado por pares]Providence, RI: American Mathematical SocietyTexto completo disponível |
10 |
Material Type: Artigo
|
![]() |
Oxidation-reduction capacities of aquifer solidsBarcelona, Michael J ; Holm, Thomas REnvironmental science & technology, 1991-09, Vol.25 (9), p.1565-1572 [Periódico revisado por pares]Washington, DC: American Chemical SocietyTexto completo disponível |