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Development of spin-coated Si/TiOx/Pt/TiOx electrodes for the electrochemical ozone production
Development of spin-coated Si/TiOx/Pt/TiOx electrodes for the electrochemical ozone production
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Development of spin-coated Si/TiOx/Pt/TiOx electrodes for the electrochemical ozone production

Mohammad, Ahmad M. ; Kitsuka, Kenta ; Abdullah, Aboubakr M. ; Awad, Mohamed I. ; Okajima, Takeyoshi ; Kaneda, Kazuhiro ; Ikematsu, Mineo ; Ohsaka, Takeo

Applied surface science, 2009-07, Vol.255 (20), p.8458-8463 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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2
Surface processes of selective growth by atomic layer epitaxy
Surface processes of selective growth by atomic layer epitaxy
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Surface processes of selective growth by atomic layer epitaxy

Isshiki, Hideo ; Aoyagi, Yoshinobu ; Sugano, Takuo ; Iwai, Sohachi ; Meguro, Takashi

Applied surface science, 1994-12, Vol.82 (1-4), p.57-63 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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3
Tunable UV laser induced digital etching of GaAs: wavelength dependence of etch rate and surface processes
Tunable UV laser induced digital etching of GaAs: wavelength dependence of etch rate and surface processes
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Tunable UV laser induced digital etching of GaAs: wavelength dependence of etch rate and surface processes

Meguro, T. ; Sakai, K. ; Yamamoto, Y. ; Sugano, T. ; Aoyagi, Y.

Applied surface science, 1996, Vol.106, p.365-368 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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4
Self limiting growth on nominally oriented (111)A GaAs substrates in atomic layer epitaxy
Self limiting growth on nominally oriented (111)A GaAs substrates in atomic layer epitaxy
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Self limiting growth on nominally oriented (111)A GaAs substrates in atomic layer epitaxy

Lee, Jeong-Sik ; Iwai, Sohachi ; Isshiki, Hideo ; Meguro, Takashi ; Sugano, Takuo ; Aoyagi, Yoshinobu

Applied surface science, 1996, Vol.103 (3), p.275-278 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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5
Surface reaction control in digital etching of GaAs by using a tunable UV laser system: reaction control mechanism in layer-by-layer etching
Surface reaction control in digital etching of GaAs by using a tunable UV laser system: reaction control mechanism in layer-by-layer etching
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Surface reaction control in digital etching of GaAs by using a tunable UV laser system: reaction control mechanism in layer-by-layer etching

Ishii, M. ; Meguro, T. ; Sugano, T. ; Gamo, K. ; Aoyagi, Y.

Applied surface science, 1995, Vol.86 (1), p.554-558 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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