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Phase-controllable laser thinning in MoTe2
Phase-controllable laser thinning in MoTe2
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Phase-controllable laser thinning in MoTe2

Kang, Seohui ; Won, Dongyeun ; Yang, Heejun ; Lin, Chia-Hsien ; Ku, Ching-Shun ; Chiang, Ching-Yu ; Kim, Sera ; Cho, Suyeon

Applied surface science, 2021-10, Vol.563, p.150282, Article 150282 [Periódico revisado por pares]

Elsevier B.V

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2
Atomistic simulations of the thinning process of tantalum/copper heterostructure in wafer containing through silicon via
Atomistic simulations of the thinning process of tantalum/copper heterostructure in wafer containing through silicon via
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Atomistic simulations of the thinning process of tantalum/copper heterostructure in wafer containing through silicon via

Xu, Kezhong ; Zhou, Yuqi ; Yu, Ziniu ; Gao, Yuhan ; Chen, Yuxin ; Lei, Xin ; Xiong, Chuanguo ; Lv, Weishan ; Zhu, Fulong

Applied surface science, 2024-12, Vol.676, p.161026, Article 161026 [Periódico revisado por pares]

Elsevier B.V

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3
Fast chemical thinning of germanium wafers for optoelectronic applications
Fast chemical thinning of germanium wafers for optoelectronic applications
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Fast chemical thinning of germanium wafers for optoelectronic applications

Sanchez-Perez, Clara ; Garcia, Ivan ; Rey-Stolle, Ignacio

Applied surface science, 2022-03, Vol.579, p.152199, Article 152199 [Periódico revisado por pares]

Elsevier B.V

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4
Thermal-protective and oxygen-resistant nanocoating using silica-nanocomposites for laser thinning of polymorphic molybdenum ditellurides
Thermal-protective and oxygen-resistant nanocoating using silica-nanocomposites for laser thinning of polymorphic molybdenum ditellurides
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Thermal-protective and oxygen-resistant nanocoating using silica-nanocomposites for laser thinning of polymorphic molybdenum ditellurides

Heo, Soyoung ; Kim, Seulbi ; Lee, Seung Yeon ; Kwak, In Hye ; Baik, Jaeyoon ; Yang, Heejun ; Park, Ji Hun ; Cho, Suyeon

Applied surface science, 2023-11, Vol.638, p.157958, Article 157958 [Periódico revisado por pares]

Elsevier B.V

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5
Atomic structures and electronic properties of different interface types at Al/c-SiO2 interfaces
Atomic structures and electronic properties of different interface types at Al/c-SiO2 interfaces
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Atomic structures and electronic properties of different interface types at Al/c-SiO2 interfaces

Jia, Baonan ; Hu, Yingshi ; Guan, Xiaoning ; Hao, Jinbo ; Yan, Binbin ; Zu, Yunxiao ; Liu, Gang ; Zhang, Qi ; Peng, Gang-Ding ; Lu, Pengfei

Applied surface science, 2022-03, Vol.578, p.151932, Article 151932 [Periódico revisado por pares]

Elsevier B.V

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6
Evolution and influence of GaN/AlN heterointerface during the thinning process of GaN film
Evolution and influence of GaN/AlN heterointerface during the thinning process of GaN film
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Evolution and influence of GaN/AlN heterointerface during the thinning process of GaN film

Zhou, Yuqi ; Huang, Yuhua ; Li, Jinming ; Zhu, Fulong

Applied surface science, 2023-01, Vol.608, p.155151, Article 155151 [Periódico revisado por pares]

Elsevier B.V

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7
Layer-controllable graphene by plasma thinning and post-annealing
Layer-controllable graphene by plasma thinning and post-annealing
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Layer-controllable graphene by plasma thinning and post-annealing

Zhang, Lufang ; Feng, Shaopeng ; Xiao, Shaoqing ; Shen, Gang ; Zhang, Xiumei ; Nan, Haiyan ; Gu, Xiaofeng ; Ostrikov, Kostya (Ken)

Applied surface science, 2018-05, Vol.441, p.639-646 [Periódico revisado por pares]

Elsevier B.V

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8
Robust cleaning mechanism permanently detaches hydrocarbon species from silicate surfaces by amphiphiles
Robust cleaning mechanism permanently detaches hydrocarbon species from silicate surfaces by amphiphiles
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Robust cleaning mechanism permanently detaches hydrocarbon species from silicate surfaces by amphiphiles

Hosseini, Ehsan ; Zakertabrizi, Mohammad ; Shariati, Saba ; Islam Rajib, Amirul ; Fini, Elham H.

Applied surface science, 2021-08, Vol.558, p.149954, Article 149954 [Periódico revisado por pares]

Elsevier B.V

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9
Influence of Si wafer thinning processes on (sub)surface defects
Influence of Si wafer thinning processes on (sub)surface defects
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Influence of Si wafer thinning processes on (sub)surface defects

Inoue, Fumihiro ; Jourdain, Anne ; Peng, Lan ; Phommahaxay, Alain ; De Vos, Joeri ; Rebibis, Kenneth June ; Miller, Andy ; Sleeckx, Erik ; Beyne, Eric ; Uedono, Akira

Applied surface science, 2017-05, Vol.404, p.82-87 [Periódico revisado por pares]

Elsevier B.V

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10
Research on epitaxial of 250 nm high quality GaN HEMT based on AlN surface leveling technology
Research on epitaxial of 250 nm high quality GaN HEMT based on AlN surface leveling technology
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Research on epitaxial of 250 nm high quality GaN HEMT based on AlN surface leveling technology

Zhang, Dongguo ; Li, Zhonghui ; Yang, Qiankun ; Peng, Daqing ; Li, Chuanhao ; Luo, Weike ; Dong, Xun

Applied surface science, 2020-04, Vol.509, p.145339, Article 145339 [Periódico revisado por pares]

Elsevier B.V

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