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Recent developments in electrical linewidth and overlay metrology for integrated circuit fabrication processesCRESSWELL, M. W ; SNIEGOWSKI, J. J ; GHOSHTAGORE, R. N ; ALLEN, R. A ; GUTHRIE, W. F ; GURNELL, A. W ; LINHOLM, L. W ; DIXSON, R. G ; TEAGUE, E. CJapanese Journal of Applied Physics, 1996-12, Vol.35 (12B), p.6597-6609 [Periódico revisado por pares]Tokyo: Japanese journal of applied physicsTexto completo disponível |