Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Ata de Congresso
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Nested Uncertainties and Hybrid Metrology to Improve Measurement AccuracySILVER, R. M ; ZHANG, N. F ; BARNES, B. M ; ZHOU, H ; QIN, J ; DIXSON, RProceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.7971Bellingham, Wash: SPIETexto completo disponível |
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Material Type: Ata de Congresso
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A Bayesian Statistical Model for Hybrid Metrology to Improve Measurement AccuracySILVER, R. M ; ZHANG, N. F ; BAMES, B. M ; QIN, J ; ZHOU, H ; DIXSON, RProceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.8083Bellingham, Wash: SPIETexto completo disponível |
3 |
Material Type: Ata de Congresso
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Reference metrology using a next-generation CD-AFMDixson, Ronald ; Guerry, AngelaProceedings of SPIE, 2004, Vol.5375, p.633-646SPIETexto completo disponível |
4 |
Material Type: Ata de Congresso
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CD-AFM reference metrology at NIST and SEMATECHDixson, Ronald ; Fu, Joseph ; Orji, Ndubuisi ; Guthrie, William ; Allen, Richard ; Cresswell, MichaelProc. SPIE, 2005, Vol.5752, p.324-336Bellingham WA: SPIETexto completo disponível |
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Material Type: Ata de Congresso
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Implementation of Reference Measurement System using CD-AFMDixson, Ronald G ; Guerry, Angela ; Bennett, Marylyn H ; Vorburger, Theodore V ; Bunday, Benjamin DProceedings of SPIE, 2003, Vol.5038, p.150-165SPIETexto completo disponível |
6 |
Material Type: Artigo
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Comparison of SEM and HRTEM CD Measurements Extracted From Test Structures Having Feature Linewidths From 40 to 240 nmCresswell, M.W. ; Allen, R.A. ; Guthrie, W.F. ; Murabito, C.E. ; Dixson, R.G. ; Hunt, A.IEEE transactions on instrumentation and measurement, 2008-01, Vol.57 (1), p.100-109 [Periódico revisado por pares]New York: IEEETexto completo disponível |
7 |
Material Type: Ata de Congresso
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Toward traceability for at-line AFM dimensional metrologyDixson, Ronald G ; Guerry, Angela ; Bennett, Marylyn H ; Vorburger, Theodore V ; Postek, Michael TSPIE proceedings series, 2002, Vol.4689, p.313-335Bellingham WA: SPIETexto completo disponível |
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Material Type: Artigo
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Comparison of Measurement Techniques for Linewidth Metrology on Advanced PhotomasksSmith, S. ; Tsiamis, A. ; McCallum, M. ; Hourd, A.C. ; Stevenson, J.T.M. ; Walton, A.J. ; Dixson, R.G. ; Allen, R.A. ; Potzick, J.E. ; Cresswell, M.W. ; Orji, N.G.IEEE transactions on semiconductor manufacturing, 2009-02, Vol.22 (1), p.72-79 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |
9 |
Material Type: Artigo
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The role of periodic interferometer errors in the calibration of capacitance displacement sensors for nanometrology applicationsKöning, R ; Dixson, R ; Fu, J ; Vorburger, T VMeasurement science & technology, 2001-11, Vol.12 (11), p.2002-2008 [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |
10 |
Material Type: Ata de Congresso
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Silicon single atom steps as AFM height standardsDixson, Ronald G ; Orji, Ndubuisi G ; Fu, Joseph ; Tsai, Vincent ; Williams, Ellen D ; Kacker, Raghu ; Vorburger, Theodore V ; Edwards, Hal L ; Cook, Debra ; West, Paul E ; Nyffenegger, RalphSPIE proceedings series, 2001, Vol.4344, p.157-168Bellingham WA: SPIETexto completo disponível |