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Refinado por: assunto: Metrology remover
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1
Nested Uncertainties and Hybrid Metrology to Improve Measurement Accuracy
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Nested Uncertainties and Hybrid Metrology to Improve Measurement Accuracy

SILVER, R. M ; ZHANG, N. F ; BARNES, B. M ; ZHOU, H ; QIN, J ; DIXSON, R

Proceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.7971

Bellingham, Wash: SPIE

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2
A Bayesian Statistical Model for Hybrid Metrology to Improve Measurement Accuracy
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A Bayesian Statistical Model for Hybrid Metrology to Improve Measurement Accuracy

SILVER, R. M ; ZHANG, N. F ; BAMES, B. M ; QIN, J ; ZHOU, H ; DIXSON, R

Proceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.8083

Bellingham, Wash: SPIE

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3
Reference metrology using a next-generation CD-AFM
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Reference metrology using a next-generation CD-AFM

Dixson, Ronald ; Guerry, Angela

Proceedings of SPIE, 2004, Vol.5375, p.633-646

SPIE

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4
CD-AFM reference metrology at NIST and SEMATECH
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CD-AFM reference metrology at NIST and SEMATECH

Dixson, Ronald ; Fu, Joseph ; Orji, Ndubuisi ; Guthrie, William ; Allen, Richard ; Cresswell, Michael

Proc. SPIE, 2005, Vol.5752, p.324-336

Bellingham WA: SPIE

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5
Implementation of Reference Measurement System using CD-AFM
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Implementation of Reference Measurement System using CD-AFM

Dixson, Ronald G ; Guerry, Angela ; Bennett, Marylyn H ; Vorburger, Theodore V ; Bunday, Benjamin D

Proceedings of SPIE, 2003, Vol.5038, p.150-165

SPIE

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6
Comparison of SEM and HRTEM CD Measurements Extracted From Test Structures Having Feature Linewidths From 40 to 240 nm
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Artigo
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Comparison of SEM and HRTEM CD Measurements Extracted From Test Structures Having Feature Linewidths From 40 to 240 nm

Cresswell, M.W. ; Allen, R.A. ; Guthrie, W.F. ; Murabito, C.E. ; Dixson, R.G. ; Hunt, A.

IEEE transactions on instrumentation and measurement, 2008-01, Vol.57 (1), p.100-109 [Periódico revisado por pares]

New York: IEEE

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7
Toward traceability for at-line AFM dimensional metrology
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Toward traceability for at-line AFM dimensional metrology

Dixson, Ronald G ; Guerry, Angela ; Bennett, Marylyn H ; Vorburger, Theodore V ; Postek, Michael T

SPIE proceedings series, 2002, Vol.4689, p.313-335

Bellingham WA: SPIE

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8
Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks
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Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks

Smith, S. ; Tsiamis, A. ; McCallum, M. ; Hourd, A.C. ; Stevenson, J.T.M. ; Walton, A.J. ; Dixson, R.G. ; Allen, R.A. ; Potzick, J.E. ; Cresswell, M.W. ; Orji, N.G.

IEEE transactions on semiconductor manufacturing, 2009-02, Vol.22 (1), p.72-79 [Periódico revisado por pares]

New York, NY: IEEE

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9
The role of periodic interferometer errors in the calibration of capacitance displacement sensors for nanometrology applications
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The role of periodic interferometer errors in the calibration of capacitance displacement sensors for nanometrology applications

Köning, R ; Dixson, R ; Fu, J ; Vorburger, T V

Measurement science & technology, 2001-11, Vol.12 (11), p.2002-2008 [Periódico revisado por pares]

Bristol: IOP Publishing

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10
Silicon single atom steps as AFM height standards
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Silicon single atom steps as AFM height standards

Dixson, Ronald G ; Orji, Ndubuisi G ; Fu, Joseph ; Tsai, Vincent ; Williams, Ellen D ; Kacker, Raghu ; Vorburger, Theodore V ; Edwards, Hal L ; Cook, Debra ; West, Paul E ; Nyffenegger, Ralph

SPIE proceedings series, 2001, Vol.4344, p.157-168

Bellingham WA: SPIE

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