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Refinado por: tipo de recurso: Standards remover
Result Number Material Type Add to My Shelf Action Record Details and Options
1
Study on the Quantum Confinement of Photo-Generated Carriers in Quantum Wells
Material Type:
Standard
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Study on the Quantum Confinement of Photo-Generated Carriers in Quantum Wells

Ding, Ding ; Liu, Weiye ; Guo, Jiaping ; Tan, Xinhui ; Zhang, Wei ; Han, Lili ; Wang, Zhaowei ; Gong, Weihua ; Tang, Xiansheng

Photonics Journal, IEEE, 2023, Vol.15, p.1-4

IEEE

Sem texto completo

2
Design of 7T SRAM Using InGaAs-Dual Pocket-Dual Gate-Tunnel FET for IoT Applications
Material Type:
Standard
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Design of 7T SRAM Using InGaAs-Dual Pocket-Dual Gate-Tunnel FET for IoT Applications

Rasheed, Gadarapulla ; Sridevi, Sriadibhatla

Access, IEEE, 2023, Vol.11, p.76034-76045

IEEE

Sem texto completo

3
Co-Diffused Back-Contact Back-Junction Silicon Solar Cells without Gap Regions
Material Type:
Standard
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Co-Diffused Back-Contact Back-Junction Silicon Solar Cells without Gap Regions

Keding, Roman ; Stuwe, David ; Kamp, Mathias ; Reichel, Christian ; Wolf, Andreas ; Woehl, Robert ; Borchert, Dietmar ; Reinecke, Holger ; Biro, Daniel

Photovoltaics, IEEE Journal of, 2013, Vol.3, p.1236-1242

IEEE

Sem texto completo

4
A Near-Infrared Enhanced Field-Line Crowding Based CMOS-Integrated Avalanche Photodiode
Material Type:
Standard
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A Near-Infrared Enhanced Field-Line Crowding Based CMOS-Integrated Avalanche Photodiode

Kohneh Poushi, Seyed Saman ; Gasser, Christoph ; Goll, Bernhard ; Hofbauer, Michael ; Schneider-Hornstein, Kerstin ; Zimmermann, Horst

Photonics Journal, IEEE, 2023, Vol.15, p.1-9

IEEE

Sem texto completo

5
Analyses and Experiments of Ultralow Specific On-Resistance LDMOS With Integrated Diodes
Material Type:
Standard
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Analyses and Experiments of Ultralow Specific On-Resistance LDMOS With Integrated Diodes

Wei, Jie ; Dai, Kaiwei ; Luo, Xiaorong ; Ma, Zhen ; Li, Jie ; Li, Congcong ; Zhang, Bo

Electron Devices Society, IEEE Journal of the, 2021, Vol.9, p.1161-1165

IEEE

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6
InAs Diodes Fabricated Using Be Ion Implantation
Material Type:
Standard
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InAs Diodes Fabricated Using Be Ion Implantation

White, Benjamin S ; Sandall, Ian C ; David, John P. R ; Tan, Chee Hing

Electron Devices, IEEE Transactions on, 2015, Vol.62, p.2928-2932

IEEE

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7
F1153 Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements
Material Type:
Standard
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F1153 Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements

1992

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8
F978 Standard Test Method for Characterizing Semiconductor Deep Levels by Transient Capacitance Techniques
Material Type:
Standard
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F978 Standard Test Method for Characterizing Semiconductor Deep Levels by Transient Capacitance Techniques

2001

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9
F72 Standard Specification for Gold Wire for Semiconductor Lead Bonding
Material Type:
Standard
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F72 Standard Specification for Gold Wire for Semiconductor Lead Bonding

2001

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10
F72 Standard Specification for Gold Wire for Semiconductor Lead Bonding
Material Type:
Standard
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F72 Standard Specification for Gold Wire for Semiconductor Lead Bonding

2001

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