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Refinado por: assunto: Materials Science, Multidisciplinary remover
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Growth and Selective Etch of Phosphorus-Doped Silicon/Silicon–Germanium Multilayers Structures for Vertical Transistors Application
Growth and Selective Etch of Phosphorus-Doped Silicon/Silicon–Germanium Multilayers Structures for Vertical Transistors Application
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Growth and Selective Etch of Phosphorus-Doped Silicon/Silicon–Germanium Multilayers Structures for Vertical Transistors Application

Li, Chen ; Lin, Hongxiao ; Li, Junjie ; Yin, Xiaogen ; Zhang, Yongkui ; Kong, Zhenzhen ; Wang, Guilei ; Zhu, Huilong ; Radamson, Henry H.

Nanoscale research letters, 2020-12, Vol.15 (1), p.225-225, Article 225 [Periódico revisado por pares]

New York: Springer US

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2
Study on the Influence of Etchant Composition and Etching Process on the Precision of Stainless‐Steel Microchannel and Etching Mechanism
Study on the Influence of Etchant Composition and Etching Process on the Precision of Stainless‐Steel Microchannel and Etching Mechanism
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Study on the Influence of Etchant Composition and Etching Process on the Precision of Stainless‐Steel Microchannel and Etching Mechanism

Wei, Yanni ; Zhu, Linghao ; Jia, Lei ; Chen, Yu ; Li, Yaru

Advanced engineering materials, 2024-05, Vol.26 (10), p.n/a [Periódico revisado por pares]

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3
Fabrication of Ultralow‐Bevel Angle Mesa Structures for Vertical GaN Devices
Fabrication of Ultralow‐Bevel Angle Mesa Structures for Vertical GaN Devices
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Fabrication of Ultralow‐Bevel Angle Mesa Structures for Vertical GaN Devices

Tarenko, Jarosław ; Kamiński, Maciej ; Taube, Andrzej ; Ekielski, Marek ; Kruszka, Renata ; Zadura, Magdalena ; Szerling, Anna ; Prystawko, Paweł ; Boćkowski, Michał ; Król, Krystian ; Jankowska‐Śliwińska, Joanna ; Komorowska, Katarzyna ; Grzegory, Izabella

Physica status solidi. A, Applications and materials science, 2024-04 [Periódico revisado por pares]

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4
Investigation of Field‐Effect Passivation Created by Hydrogen Plasma Etching of Radio Corporation of America Formed Chemical Oxides on Crystalline Silicon Wafers
Investigation of Field‐Effect Passivation Created by Hydrogen Plasma Etching of Radio Corporation of America Formed Chemical Oxides on Crystalline Silicon Wafers
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Investigation of Field‐Effect Passivation Created by Hydrogen Plasma Etching of Radio Corporation of America Formed Chemical Oxides on Crystalline Silicon Wafers

Jia, Haitian ; Tang, Muzhi ; Ge, Jia

Physica status solidi. A, Applications and materials science, 2021-01, Vol.218 (2), p.n/a [Periódico revisado por pares]

Weinheim: Wiley Subscription Services, Inc

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5
Controlling Vertical Asymmetry of Nanocrystals Through Anisotropic Etching‐Assisted Nanosphere Lithography
Controlling Vertical Asymmetry of Nanocrystals Through Anisotropic Etching‐Assisted Nanosphere Lithography
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Controlling Vertical Asymmetry of Nanocrystals Through Anisotropic Etching‐Assisted Nanosphere Lithography

Ganguly, Arnab ; Zafar, Humaira ; Howells, Calvyn Travis ; Pereira, Mauro Fernandes ; Das, Gobind

Small structures, 2024-03, Vol.5 (3), p.n/a [Periódico revisado por pares]

Weinheim: John Wiley & Sons, Inc

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6
Influence of Fluence and Pulse Number on Laser Cleaning of Atmospheric‐Pressure‐Plasma‐Jet‐Etched Optical Glasses
Influence of Fluence and Pulse Number on Laser Cleaning of Atmospheric‐Pressure‐Plasma‐Jet‐Etched Optical Glasses
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Influence of Fluence and Pulse Number on Laser Cleaning of Atmospheric‐Pressure‐Plasma‐Jet‐Etched Optical Glasses

Heinke, Robert ; Arnold, Thomas ; Ehrhardt, Martin ; Lorenz, Pierre ; Zimmer, Klaus

Physica status solidi. A, Applications and materials science, 2023-10 [Periódico revisado por pares]

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7
Influence of WC-Co Substrate Pretreatment on Diamond Film Deposition by Laser-Assisted Combustion Synthesis
Influence of WC-Co Substrate Pretreatment on Diamond Film Deposition by Laser-Assisted Combustion Synthesis
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Influence of WC-Co Substrate Pretreatment on Diamond Film Deposition by Laser-Assisted Combustion Synthesis

Veillère, Amélie ; Guillemet, Thomas ; Xie, Zhi Qiang ; Zuhlke, Craig A ; Alexander, Dennis R ; Silvain, Jean-François ; Heintz, Jean-Marc ; Chandra, Namas ; Lu, Yong Feng

ACS applied materials & interfaces, 2011-04, Vol.3 (4), p.1134-1139 [Periódico revisado por pares]

United States: American Chemical Society

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8
Selective etching during the electrochemical C-V profiling of PM-HEMTs
Selective etching during the electrochemical C-V profiling of PM-HEMTs
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Selective etching during the electrochemical C-V profiling of PM-HEMTs

Kayambaki, M. ; Tsagaraki, K. ; Lagadas, M. ; Panayotatos, P.

Materials science & engineering. B, Solid-state materials for advanced technology, 2001-03, Vol.80 (1), p.164-167 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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9
Producing Silicon Carbide Micro and Nanostructures by Plasma‐Free Metal‐Assisted Chemical Etching
Producing Silicon Carbide Micro and Nanostructures by Plasma‐Free Metal‐Assisted Chemical Etching
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Producing Silicon Carbide Micro and Nanostructures by Plasma‐Free Metal‐Assisted Chemical Etching

Michaels, Julian A. ; Janavicius, Lukas ; Wu, Xihang ; Chan, Clarence ; Huang, Hsieh‐Chih ; Namiki, Shunya ; Kim, Munho ; Sievers, Dane ; Li, Xiuling

Advanced functional materials, 2021-08, Vol.31 (32), p.n/a [Periódico revisado por pares]

Hoboken: Wiley Subscription Services, Inc

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10
Complementary etching behavior of alkali, metal‐catalyzed chemical, and post‐etching of multicrystalline silicon wafers
Complementary etching behavior of alkali, metal‐catalyzed chemical, and post‐etching of multicrystalline silicon wafers
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Complementary etching behavior of alkali, metal‐catalyzed chemical, and post‐etching of multicrystalline silicon wafers

Zou, Shuai ; Ye, Xiaoya ; Wu, Chengkun ; Cheng, Kexun ; Fang, Liang ; Tang, Rujun ; Shen, Mingrong ; Wang, Xusheng ; Su, Xiaodong

Progress in photovoltaics, 2019-06, Vol.27 (6), p.511-519 [Periódico revisado por pares]

Bognor Regis: Wiley Subscription Services, Inc

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