skip to main content
Idioma:
Primo Advanced Search
Primo Advanced Search Query Term
Primo Advanced Search Query Term
Primo Advanced Search Query Term
Primo Advanced Search prefilters
Busca Simples
Resultados 1 2 3 4 5 next page
Mostrar Somente
Refinado por: assunto: Physics, Applied remover
Result Number Material Type Add to My Shelf Action Record Details and Options
1
Growth and Selective Etch of Phosphorus-Doped Silicon/Silicon–Germanium Multilayers Structures for Vertical Transistors Application
Growth and Selective Etch of Phosphorus-Doped Silicon/Silicon–Germanium Multilayers Structures for Vertical Transistors Application
Material Type:
Artigo 		Adicionar ao Meu Espaço

Growth and Selective Etch of Phosphorus-Doped Silicon/Silicon–Germanium Multilayers Structures for Vertical Transistors Application

Li, Chen ; Lin, Hongxiao ; Li, Junjie ; Yin, Xiaogen ; Zhang, Yongkui ; Kong, Zhenzhen ; Wang, Guilei ; Zhu, Huilong ; Radamson, Henry H.

Nanoscale research letters, 2020-12, Vol.15 (1), p.225-225, Article 225 [Periódico revisado por pares]

New York: Springer US

Texto completo disponível

Citações Citado por
2
Fabrication of Ultralow‐Bevel Angle Mesa Structures for Vertical GaN Devices
Fabrication of Ultralow‐Bevel Angle Mesa Structures for Vertical GaN Devices
Material Type:
Artigo 		Adicionar ao Meu Espaço

Fabrication of Ultralow‐Bevel Angle Mesa Structures for Vertical GaN Devices

Tarenko, Jarosław ; Kamiński, Maciej ; Taube, Andrzej ; Ekielski, Marek ; Kruszka, Renata ; Zadura, Magdalena ; Szerling, Anna ; Prystawko, Paweł ; Boćkowski, Michał ; Król, Krystian ; Jankowska‐Śliwińska, Joanna ; Komorowska, Katarzyna ; Grzegory, Izabella

Physica status solidi. A, Applications and materials science, 2024-04 [Periódico revisado por pares]

Texto completo disponível

Citações Citado por
3
Investigation of Field‐Effect Passivation Created by Hydrogen Plasma Etching of Radio Corporation of America Formed Chemical Oxides on Crystalline Silicon Wafers
Investigation of Field‐Effect Passivation Created by Hydrogen Plasma Etching of Radio Corporation of America Formed Chemical Oxides on Crystalline Silicon Wafers
Material Type:
Artigo 		Adicionar ao Meu Espaço

Investigation of Field‐Effect Passivation Created by Hydrogen Plasma Etching of Radio Corporation of America Formed Chemical Oxides on Crystalline Silicon Wafers

Jia, Haitian ; Tang, Muzhi ; Ge, Jia

Physica status solidi. A, Applications and materials science, 2021-01, Vol.218 (2), p.n/a [Periódico revisado por pares]

Weinheim: Wiley Subscription Services, Inc

Texto completo disponível

Citações Citado por
4
Influence of Fluence and Pulse Number on Laser Cleaning of Atmospheric‐Pressure‐Plasma‐Jet‐Etched Optical Glasses
Influence of Fluence and Pulse Number on Laser Cleaning of Atmospheric‐Pressure‐Plasma‐Jet‐Etched Optical Glasses
Material Type:
Artigo 		Adicionar ao Meu Espaço

Influence of Fluence and Pulse Number on Laser Cleaning of Atmospheric‐Pressure‐Plasma‐Jet‐Etched Optical Glasses

Heinke, Robert ; Arnold, Thomas ; Ehrhardt, Martin ; Lorenz, Pierre ; Zimmer, Klaus

Physica status solidi. A, Applications and materials science, 2023-10 [Periódico revisado por pares]

Texto completo disponível

Citações Citado por
5
Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication
Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication
Material Type:
Artigo 		Adicionar ao Meu Espaço

Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication

Huff, Michael

Micromachines (Basel), 2021-08, Vol.12 (8), p.991 [Periódico revisado por pares]

Basel: MDPI AG

Texto completo disponível

Citações Citado por
6
Producing Silicon Carbide Micro and Nanostructures by Plasma‐Free Metal‐Assisted Chemical Etching
Producing Silicon Carbide Micro and Nanostructures by Plasma‐Free Metal‐Assisted Chemical Etching
Material Type:
Artigo 		Adicionar ao Meu Espaço

Producing Silicon Carbide Micro and Nanostructures by Plasma‐Free Metal‐Assisted Chemical Etching

Michaels, Julian A. ; Janavicius, Lukas ; Wu, Xihang ; Chan, Clarence ; Huang, Hsieh‐Chih ; Namiki, Shunya ; Kim, Munho ; Sievers, Dane ; Li, Xiuling

Advanced functional materials, 2021-08, Vol.31 (32), p.n/a [Periódico revisado por pares]

Hoboken: Wiley Subscription Services, Inc

Texto completo disponível

Citações Citado por
7
Complementary etching behavior of alkali, metal‐catalyzed chemical, and post‐etching of multicrystalline silicon wafers
Complementary etching behavior of alkali, metal‐catalyzed chemical, and post‐etching of multicrystalline silicon wafers
Material Type:
Artigo 		Adicionar ao Meu Espaço

Complementary etching behavior of alkali, metal‐catalyzed chemical, and post‐etching of multicrystalline silicon wafers

Zou, Shuai ; Ye, Xiaoya ; Wu, Chengkun ; Cheng, Kexun ; Fang, Liang ; Tang, Rujun ; Shen, Mingrong ; Wang, Xusheng ; Su, Xiaodong

Progress in photovoltaics, 2019-06, Vol.27 (6), p.511-519 [Periódico revisado por pares]

Bognor Regis: Wiley Subscription Services, Inc

Texto completo disponível

Citações Citado por
8
Metal‐Assisted Chemical Etching of Silicon in Oxidizing HF Solutions: Origin, Mechanism, Development, and Black Silicon Solar Cell Application
Metal‐Assisted Chemical Etching of Silicon in Oxidizing HF Solutions: Origin, Mechanism, Development, and Black Silicon Solar Cell Application
Material Type:
Artigo 		Adicionar ao Meu Espaço

Metal‐Assisted Chemical Etching of Silicon in Oxidizing HF Solutions: Origin, Mechanism, Development, and Black Silicon Solar Cell Application

Huo, Chenliang ; Wang, Jiang ; Fu, Haoxin ; Li, Xianlun ; Yang, Yi ; Wang, Hui ; Mateen, Abdul ; Farid, Ghulam ; Peng, Kui‐Qing

Advanced functional materials, 2020-12, Vol.30 (52), p.n/a [Periódico revisado por pares]

Hoboken: Wiley Subscription Services, Inc

Texto completo disponível

Citações Citado por
9
Structuring of Si into Multiple Scales by Metal‐Assisted Chemical Etching
Structuring of Si into Multiple Scales by Metal‐Assisted Chemical Etching
Material Type:
Artigo 		Adicionar ao Meu Espaço

Structuring of Si into Multiple Scales by Metal‐Assisted Chemical Etching

Srivastava, Ravi P. ; Khang, Dahl‐Young

Advanced materials (Weinheim), 2021-11, Vol.33 (47), p.e2005932-n/a [Periódico revisado por pares]

Germany: Wiley Subscription Services, Inc

Texto completo disponível

Citações Citado por
10
Hybrid Anodic and Metal‐Assisted Chemical Etching Method Enabling Fabrication of Silicon Carbide Nanowires
Hybrid Anodic and Metal‐Assisted Chemical Etching Method Enabling Fabrication of Silicon Carbide Nanowires
Material Type:
Artigo 		Adicionar ao Meu Espaço

Hybrid Anodic and Metal‐Assisted Chemical Etching Method Enabling Fabrication of Silicon Carbide Nanowires

Chen, Yun ; Zhang, Cheng ; Li, Liyi ; Zhou, Shuang ; Chen, Xin ; Gao, Jian ; Zhao, Ni ; Wong, Ching‐Ping

Small (Weinheim an der Bergstrasse, Germany), 2019-02, Vol.15 (7), p.e1803898-n/a [Periódico revisado por pares]

Germany: Wiley Subscription Services, Inc

Texto completo disponível

Citações Citado por
Resultados 1 2 3 4 5 next page

Personalize Seus Resultados

  1. Editar

Refine Search Results

Expandir Meus Resultados

  1.   

Mostrar Somente

  1. Recursos Online (17.173)
  2. Revistas revisadas por pares (15.225)

Refinar Meus Resultados

Tipo de Recurso 

  1. Artigos  (16.614)
  2. Anais de Congresso  (1.716)
  3. magazinearticle  (100)
  4. Book Chapters  (16)
  5. Mais opções open sub menu

Data de Publicação 

De até
Refinar
  1. Antes de1969  (47)
  2. 1969Até1982  (236)
  3. 1983Até1996  (1.754)
  4. 1997Até2011  (6.739)
  5. Após 2011  (9.693)
  6. Mais opções open sub menu

Idioma 

  1. Japonês  (3.735)
  2. Russo  (11)
  3. Norueguês  (6)
  4. Letão  (3)
  5. Alemão  (2)
  6. Polonês  (1)
  7. Coreano  (1)
  8. Mais opções open sub menu

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

Buscando em bases de dados remotas. Favor aguardar.