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21
Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 1. Growth mechanism and chemical structure of deposited a-SiC:H films
Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 1. Growth mechanism and chemical structure of deposited a-SiC:H films
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Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 1. Growth mechanism and chemical structure of deposited a-SiC:H films

Wrobel, A.M. ; Walkiewicz-Pietrzykowska, A. ; Uznanski, P.

Thin solid films, 2014-08, Vol.564, p.222-231 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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22
Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma
Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma
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Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma

Li, D. ; Carette, M. ; Granier, A. ; Landesman, J.P. ; Goullet, A.

Thin solid films, 2012-11, Vol.522, p.366-371 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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23
Degradation of phenol in water using a gas–liquid phase pulsed discharge plasma reactor
Degradation of phenol in water using a gas–liquid phase pulsed discharge plasma reactor
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Degradation of phenol in water using a gas–liquid phase pulsed discharge plasma reactor

Li, Jie ; Sato, Masayuki ; Ohshima, Takayuki

Thin solid films, 2007-03, Vol.515 (9), p.4283-4288 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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24
Guiding the deposition flux in an ionized magnetron discharge
Guiding the deposition flux in an ionized magnetron discharge
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Guiding the deposition flux in an ionized magnetron discharge

Bohlmark, J. ; Östbye, M. ; Lattemann, M. ; Ljungcrantz, H. ; Rosell, T. ; Helmersson, U.

Thin solid films, 2006-12, Vol.515 (4), p.1928-1931 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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25
Rapid plasma treatment of polyimide for improved adhesive and durable copper film deposition
Rapid plasma treatment of polyimide for improved adhesive and durable copper film deposition
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Rapid plasma treatment of polyimide for improved adhesive and durable copper film deposition

Usami, Kenji ; Ishijima, Tatsuo ; Toyoda, Hirotaka

Thin solid films, 2012-10, Vol.521, p.22-26 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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26
Glow discharge optical emission spectroscopy for accurate and well resolved analysis of coatings and thin films
Glow discharge optical emission spectroscopy for accurate and well resolved analysis of coatings and thin films
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Glow discharge optical emission spectroscopy for accurate and well resolved analysis of coatings and thin films

Wilke, Marcus ; Teichert, Gerd ; Gemma, Ryota ; Pundt, Astrid ; Kirchheim, Reiner ; Romanus, Henry ; Schaaf, Peter

Thin solid films, 2011-12, Vol.520 (5), p.1660-1667 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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27
Removal of bisphenol A in water using an integrated granular activated carbon preconcentration and dielectric barrier discharge degradation treatment
Removal of bisphenol A in water using an integrated granular activated carbon preconcentration and dielectric barrier discharge degradation treatment
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Removal of bisphenol A in water using an integrated granular activated carbon preconcentration and dielectric barrier discharge degradation treatment

Tang, Shoufeng ; Lu, Na ; Li, Jie ; Wu, Yan

Thin solid films, 2012-10, Vol.521, p.257-260 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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28
Study of plasma enhanced chemical vapor deposition of ZnO films by non-thermal plasma jet at atmospheric pressure
Study of plasma enhanced chemical vapor deposition of ZnO films by non-thermal plasma jet at atmospheric pressure
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Study of plasma enhanced chemical vapor deposition of ZnO films by non-thermal plasma jet at atmospheric pressure

Ito, Yosuke ; Sakai, Osamu ; Tachibana, Kunihide

Thin solid films, 2010-04, Vol.518 (13), p.3513-3516 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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29
Influence of bias voltages on the structure and wear properties of TiSiN coating synthesized by cathodic arc plasma evaporation
Influence of bias voltages on the structure and wear properties of TiSiN coating synthesized by cathodic arc plasma evaporation
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Influence of bias voltages on the structure and wear properties of TiSiN coating synthesized by cathodic arc plasma evaporation

Chang, Chi-Lung ; Lin, Chao-Te ; Tsai, Pi-Chuen ; Ho, Wei-Yu ; Wang, Da-Yung

Thin solid films, 2008-06, Vol.516 (16), p.5324-5329 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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30
Development of sterilization device using air nonthermal plasma jet induced by atmospheric pressure corona discharge
Development of sterilization device using air nonthermal plasma jet induced by atmospheric pressure corona discharge
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Development of sterilization device using air nonthermal plasma jet induced by atmospheric pressure corona discharge

Kuwahara, Takuya ; Kuroki, Tomoyuki ; Yoshida, Keiichiro ; Saeki, Noboru ; Okubo, Masaaki

Thin solid films, 2012-11, Vol.523, p.2-5 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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