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1963Até1977
| Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
|---|---|---|---|
| 1 |
![Stresses in SiO[sub 2] Films Obtained from the Thermal Decomposition of Tetraethylorthosilicate—Effect of Heat-Treatment and Humidity](../images/pixel.png){kind=tracking}
Material Type: Artigo
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Stresses in SiO[sub 2] Films Obtained from the Thermal Decomposition of Tetraethylorthosilicate—Effect of Heat-Treatment and HumidityAboaf, J. A.Journal of the Electrochemical Society, 1969, Vol.116 (12), p.1732 [Periódico revisado por pares]Texto completo disponível |
| 2 |
Material Type: Artigo
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Some Properties of Vapor Deposited Silicon Nitride Films Obtained by the Reaction of SiBr[sub 4] and NH[sub 3]Aboaf, J. A.Journal of the Electrochemical Society, 1969, Vol.116 (12), p.1736 [Periódico revisado por pares]Texto completo disponível |
| 3 |
Material Type: Artigo
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Deposition and Properties of Aluminum Oxide Obtained by Pyrolytic Decomposition of an Aluminum AlkoxideAboaf, J. A.Journal of the Electrochemical Society, 1967, Vol.114 (9), p.948 [Periódico revisado por pares]Texto completo disponível |
| 4 |
Material Type: Artigo
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Charge in SiO[sub 2]-Al[sub 2]O[sub 3] Double Layers on SiliconAboaf, J. A. ; Kerr, D. R. ; Bassous, E.Journal of the Electrochemical Society, 1973, Vol.120 (8), p.1103 [Periódico revisado por pares]Texto completo disponível |
| 5 |
Material Type: Artigo
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Chemical Composition and Electrical Properties of Tin Oxide Films Prepared by Vapor DepositionAboaf, J. A. ; Marcotte, V. C. ; Chou, N. J.Journal of the Electrochemical Society, 1973, Vol.120 (5), p.701 [Periódico revisado por pares]Texto completo disponível |
| 6 |
Material Type: Artigo
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Ion Implantation Effects of Nitrogen, Boron, and Aluminum in Hexagonal Silicon CarbideAddamiano, Arrigo ; Anderson, Gordon Wood ; Comas, James ; Hughes, Harold L. ; Lucke, WilliamJournal of the Electrochemical Society, 1972, Vol.119 (10), p.1355 [Periódico revisado por pares]Texto completo disponível |
| 7 |
Material Type: Artigo
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The Control of Oxygen Activities in Argon-Oxygen Mixtures by Coulometric TitrationAgrawal, Yogesh K. ; Short, David W. ; Gruenke, Roger ; Rapp, Robert A.Journal of the Electrochemical Society, 1974, Vol.121 (3), p.354 [Periódico revisado por pares]Texto completo disponível |
| 8 |
Material Type: Artigo
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Etching Characteristics and Light Figures of the {111} Surfaces of GaAsAkasaki, Isamu ; Kobayasi, HiroyukiJournal of the Electrochemical Society, 1965, Vol.112 (7), p.757 [Periódico revisado por pares]Texto completo disponível |
| 9 |
Material Type: Artigo
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The Preparation of Ultrahigh-Purity Nickel Single CrystalsAlbano, V. J. ; Soden, R. R.Journal of the Electrochemical Society, 1966, Vol.113 (5), p.511 [Periódico revisado por pares]Texto completo disponível |
| 10 |
Material Type: Artigo
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Kinetics of the Silicon-Silicontetrachloride Reaction in a Flow SystemAlstrup, Ole ; Thomas, Carl O.Journal of the Electrochemical Society, 1965, Vol.112 (3), p.319 [Periódico revisado por pares]Texto completo disponível |
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