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11
Aging of plasma-activated copper and gold surfaces and its hydrophilic recovery after water immersion
Aging of plasma-activated copper and gold surfaces and its hydrophilic recovery after water immersion
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Aging of plasma-activated copper and gold surfaces and its hydrophilic recovery after water immersion

Prysiazhnyi, Vadym ; Slavicek, Pavel ; Cernak, Mirko

Thin solid films, 2014-01, Vol.550, p.373-380 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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12
Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma
Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma
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Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma

Lee, Hyo-Chang ; Bang, Jin-Young ; Chung, Chin-Wook

Thin solid films, 2011-08, Vol.519 (20), p.7009-7013 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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13
Structural, optical and electrical properties of high-k ZrO2 dielectrics on Si prepared by plasma assisted pulsed laser deposition
Structural, optical and electrical properties of high-k ZrO2 dielectrics on Si prepared by plasma assisted pulsed laser deposition
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Structural, optical and electrical properties of high-k ZrO2 dielectrics on Si prepared by plasma assisted pulsed laser deposition

Zhang, W. ; Cui, Y. ; Hu, Z.G. ; Yu, W.L. ; Sun, J. ; Xu, N. ; Ying, Z.F. ; Wu, J.D.

Thin solid films, 2012-08, Vol.520 (20), p.6361-6367 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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14
Surface modification of biphasic calcium phosphate scaffolds by non-thermal atmospheric pressure nitrogen and air plasma treatment for improving osteoblast attachment and proliferation
Surface modification of biphasic calcium phosphate scaffolds by non-thermal atmospheric pressure nitrogen and air plasma treatment for improving osteoblast attachment and proliferation
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Surface modification of biphasic calcium phosphate scaffolds by non-thermal atmospheric pressure nitrogen and air plasma treatment for improving osteoblast attachment and proliferation

Choi, Yu-Ri ; Kwon, Jae-Sung ; Song, Doo-Hoon ; Choi, Eun Ha ; Lee, Yong-Keun ; Kim, Kyoung-Nam ; Kim, Kwang-Mahn

Thin solid films, 2013-11, Vol.547, p.235-240 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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15
Nitrogen-rich plasma polymers: Comparison of films deposited in atmospheric- and low-pressure plasmas
Nitrogen-rich plasma polymers: Comparison of films deposited in atmospheric- and low-pressure plasmas
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Nitrogen-rich plasma polymers: Comparison of films deposited in atmospheric- and low-pressure plasmas

Truica-Marasescu, Florina ; Girard-Lauriault, Pierre-Luc ; Lippitz, Andreas ; Unger, Wolfgang E.S. ; Wertheimer, Michael R.

Thin solid films, 2008-09, Vol.516 (21), p.7406-7417 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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16
Influence of substrate surface conditions on the deposition and spreading of molten droplets
Influence of substrate surface conditions on the deposition and spreading of molten droplets
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Influence of substrate surface conditions on the deposition and spreading of molten droplets

Tran, A.T.T. ; Hyland, M.M. ; Shinoda, Kentaro ; Sampath, Sanjay

Thin solid films, 2011-02, Vol.519 (8), p.2445-2456 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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17
Sputter deposition and surface treatment of TiO2 films for dye-sensitized solar cells using reactive RF plasma
Sputter deposition and surface treatment of TiO2 films for dye-sensitized solar cells using reactive RF plasma
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Sputter deposition and surface treatment of TiO2 films for dye-sensitized solar cells using reactive RF plasma

SUNG, Youl-Moon ; KIM, Hee-Je

Thin solid films, 2007-04, Vol.515 (12), p.4996-4999 [Periódico revisado por pares]

Lausanne: Elsevier Science

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18
Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 1. Growth mechanism and chemical structure of deposited a-SiC:H films
Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 1. Growth mechanism and chemical structure of deposited a-SiC:H films
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Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 1. Growth mechanism and chemical structure of deposited a-SiC:H films

Wrobel, A.M. ; Walkiewicz-Pietrzykowska, A. ; Uznanski, P.

Thin solid films, 2014-08, Vol.564, p.222-231 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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19
Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma
Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma
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Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma

Li, D. ; Carette, M. ; Granier, A. ; Landesman, J.P. ; Goullet, A.

Thin solid films, 2012-11, Vol.522, p.366-371 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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20
Synthesis of ammonia using microwave discharge at atmospheric pressure
Synthesis of ammonia using microwave discharge at atmospheric pressure
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Synthesis of ammonia using microwave discharge at atmospheric pressure

Nakajima, Jun ; Sekiguchi, Hidetoshi

Thin solid films, 2008-05, Vol.516 (13), p.4446-4451 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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