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Cold atmospheric plasma: Sources, processes, and applications
Cold atmospheric plasma: Sources, processes, and applications
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Cold atmospheric plasma: Sources, processes, and applications

BARDOS, L ; BARANKOVA, H

Thin solid films, 2010-09, Vol.518 (23), p.6705-6713 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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2
Transparent p-type conducting K-doped NiO films deposited by pulsed plasma deposition
Transparent p-type conducting K-doped NiO films deposited by pulsed plasma deposition
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Transparent p-type conducting K-doped NiO films deposited by pulsed plasma deposition

Yang, Ming ; Pu, Haifeng ; Zhou, Qianfei ; Zhang, Qun

Thin solid films, 2012-07, Vol.520 (18), p.5884-5888 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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3
Synthesis process of gold nanoparticles in solution plasma
Synthesis process of gold nanoparticles in solution plasma
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Synthesis process of gold nanoparticles in solution plasma

Saito, Nagahiro ; Hieda, Junko ; Takai, Osamu

Thin solid films, 2009-12, Vol.518 (3), p.912-917 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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4
Characteristics and applications of plasma enhanced-atomic layer deposition
Characteristics and applications of plasma enhanced-atomic layer deposition
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Characteristics and applications of plasma enhanced-atomic layer deposition

Kim, Hyungjun

Thin solid films, 2011-08, Vol.519 (20), p.6639-6644 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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5
Large area coating of graphene at low temperature using a roll-to-roll microwave plasma chemical vapor deposition
Large area coating of graphene at low temperature using a roll-to-roll microwave plasma chemical vapor deposition
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Large area coating of graphene at low temperature using a roll-to-roll microwave plasma chemical vapor deposition

Yamada, Takatoshi ; Ishihara, Masatou ; Hasegawa, Masataka

Thin solid films, 2013-04, Vol.532, p.89-93 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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6
Aging of plasma-activated copper and gold surfaces and its hydrophilic recovery after water immersion
Aging of plasma-activated copper and gold surfaces and its hydrophilic recovery after water immersion
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Aging of plasma-activated copper and gold surfaces and its hydrophilic recovery after water immersion

Prysiazhnyi, Vadym ; Slavicek, Pavel ; Cernak, Mirko

Thin solid films, 2014-01, Vol.550, p.373-380 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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7
Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma
Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma
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Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma

Lee, Hyo-Chang ; Bang, Jin-Young ; Chung, Chin-Wook

Thin solid films, 2011-08, Vol.519 (20), p.7009-7013 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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8
Surface modification of biphasic calcium phosphate scaffolds by non-thermal atmospheric pressure nitrogen and air plasma treatment for improving osteoblast attachment and proliferation
Surface modification of biphasic calcium phosphate scaffolds by non-thermal atmospheric pressure nitrogen and air plasma treatment for improving osteoblast attachment and proliferation
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Surface modification of biphasic calcium phosphate scaffolds by non-thermal atmospheric pressure nitrogen and air plasma treatment for improving osteoblast attachment and proliferation

Choi, Yu-Ri ; Kwon, Jae-Sung ; Song, Doo-Hoon ; Choi, Eun Ha ; Lee, Yong-Keun ; Kim, Kyoung-Nam ; Kim, Kwang-Mahn

Thin solid films, 2013-11, Vol.547, p.235-240 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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9
Influence of substrate surface conditions on the deposition and spreading of molten droplets
Influence of substrate surface conditions on the deposition and spreading of molten droplets
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Influence of substrate surface conditions on the deposition and spreading of molten droplets

Tran, A.T.T. ; Hyland, M.M. ; Shinoda, Kentaro ; Sampath, Sanjay

Thin solid films, 2011-02, Vol.519 (8), p.2445-2456 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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10
Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 1. Growth mechanism and chemical structure of deposited a-SiC:H films
Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 1. Growth mechanism and chemical structure of deposited a-SiC:H films
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Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 1. Growth mechanism and chemical structure of deposited a-SiC:H films

Wrobel, A.M. ; Walkiewicz-Pietrzykowska, A. ; Uznanski, P.

Thin solid films, 2014-08, Vol.564, p.222-231 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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