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11
Synthesis of Mn–Al alloy nanoparticles by plasma arc discharge
Synthesis of Mn–Al alloy nanoparticles by plasma arc discharge
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Synthesis of Mn–Al alloy nanoparticles by plasma arc discharge

Lee, Jung-Goo ; Li, Pu ; Choi, Chul-Jin ; Dong, Xing-Long

Thin solid films, 2010-10, Vol.519 (1), p.81-85 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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12
Effects of plasma-induced defects on electrical characteristics of AlGaN/GaN heterostructure before and after low-temperature annealing
Effects of plasma-induced defects on electrical characteristics of AlGaN/GaN heterostructure before and after low-temperature annealing
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Effects of plasma-induced defects on electrical characteristics of AlGaN/GaN heterostructure before and after low-temperature annealing

Takimoto, Takuma ; Takeshita, Koji ; Nakamura, Seiji ; Okumura, Tsugunori

Thin solid films, 2014-04, Vol.557, p.212-215 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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13
Fabrication of SnS2/SnS heterojunction thin film diodes by plasma-enhanced chemical vapor deposition
Fabrication of SnS2/SnS heterojunction thin film diodes by plasma-enhanced chemical vapor deposition
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Fabrication of SnS2/SnS heterojunction thin film diodes by plasma-enhanced chemical vapor deposition

Sánchez-Juárez, A. ; Tiburcio-Silver, A. ; Ortiz, A.

Thin solid films, 2005-06, Vol.480-481 (Complete), p.452-456 [Periódico revisado por pares]

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14
Effect of liquid level and laser power on the formation of spherical alumina nanoparticles by nanosecond laser ablation of alumina target
Effect of liquid level and laser power on the formation of spherical alumina nanoparticles by nanosecond laser ablation of alumina target
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Effect of liquid level and laser power on the formation of spherical alumina nanoparticles by nanosecond laser ablation of alumina target

Al-Mamun, Sharif Abdullah ; Nakajima, Reiko ; Ishigaki, Takamasa

Thin solid films, 2012-11, Vol.523, p.46-51 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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15
Effect of emitter deposition temperature on surface passivation in hot-wire chemical vapor deposited silicon heterojunction solar cells
Effect of emitter deposition temperature on surface passivation in hot-wire chemical vapor deposited silicon heterojunction solar cells
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Effect of emitter deposition temperature on surface passivation in hot-wire chemical vapor deposited silicon heterojunction solar cells

Wang, T.H. ; Iwaniczko, E. ; Page, M.R. ; Levi, D.H. ; Yan, Y. ; Branz, H.M. ; Wang, Q.

Thin solid films, 2006-04, Vol.501 (1), p.284-287 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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16
Direct growth of large grain polycrystalline silicon films on aluminum-induced crystallization seed layer using hot-wire chemical vapor deposition
Direct growth of large grain polycrystalline silicon films on aluminum-induced crystallization seed layer using hot-wire chemical vapor deposition
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Direct growth of large grain polycrystalline silicon films on aluminum-induced crystallization seed layer using hot-wire chemical vapor deposition

Wu, Bing-Rui ; Lo, Shih-Yung ; Wuu, Dong-Sing ; Ou, Sin-Liang ; Mao, Hsin-Yuan ; Wang, Jui-Hao ; Horng, Ray-Hua

Thin solid films, 2012-07, Vol.520 (18), p.5860-5866 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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17
Rapid thermal-plasma annealing of ZnO:Al films for silicon thin-film solar cells
Rapid thermal-plasma annealing of ZnO:Al films for silicon thin-film solar cells
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Rapid thermal-plasma annealing of ZnO:Al films for silicon thin-film solar cells

Ohta, N. ; Ohba, D. ; Sato, S. ; Tang, Z. ; Shimizu, H. ; Shirai, H.

Thin solid films, 2011-08, Vol.519 (20), p.6920-6927 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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18
Epitaxial growth of non-polar a-plane AlN films by low temperature sputtering using ZnO buffer layers
Epitaxial growth of non-polar a-plane AlN films by low temperature sputtering using ZnO buffer layers
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Epitaxial growth of non-polar a-plane AlN films by low temperature sputtering using ZnO buffer layers

Chen, Hou-Guang ; Jian, Sheng-Rui ; Kao, Hui-Ling ; Chen, Meei-Ru ; Huang, Gou-Zhi

Thin solid films, 2011-05, Vol.519 (15), p.5090-5094 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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19
Ultralow surface recombination in p-Si passivated by catalytic-chemical vapor deposited alumina films
Ultralow surface recombination in p-Si passivated by catalytic-chemical vapor deposited alumina films
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Ultralow surface recombination in p-Si passivated by catalytic-chemical vapor deposited alumina films

Ogita, Yoh-Ichiro ; Tachihara, Masayuki ; Aizawa, Yotaro ; Saito, Naoyuki

Thin solid films, 2011-05, Vol.519 (14), p.4469-4472 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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20
Aluminum-induced crystallization of amorphous silicon films deposited by hot wire chemical vapor deposition on glass substrates
Aluminum-induced crystallization of amorphous silicon films deposited by hot wire chemical vapor deposition on glass substrates
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Aluminum-induced crystallization of amorphous silicon films deposited by hot wire chemical vapor deposition on glass substrates

Ebil, Ozgenc ; Aparicio, Roger ; Birkmire, Robert

Thin solid films, 2010-10, Vol.519 (1), p.178-183 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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